Silicon nitride ceramic with directionally grown surface crystal grains and preparation method of silicon nitride ceramic
A silicon nitride ceramic and grain orientation technology, applied in the field of non-oxide ceramic preparation, can solve problems such as high interfacial stress, and achieve the effects of improved mechanical strength, simple and stable process, and excellent hydrophobicity
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Embodiment 1
[0052] 31.13g of silicon nitride powder and 2.20g of composite sintering aid (Y 2 o 3 , MgO and TiO 2 The molar ratio is 2:5:3) powder as raw material, absolute ethanol as solvent, placed in a ball mill tank for ball milling for 4 hours, then the dried and sieved mixture was placed in a mold, and dry-pressed at 30MPa to form the obtained The green body was formed by cold isostatic pressing at a pressure of 300 MPa. The obtained ceramic green body was placed in a carbon tube furnace, and the temperature was raised to 900° C. under vacuum conditions, and kept for 2 hours to obtain a silicon nitride ceramic body. Then, the temperature was raised to 1800° C. at a heating rate of 10° C. / min, kept for 2 hours, and then the temperature was lowered with the furnace to obtain a silicon nitride ceramic matrix material. The surface of the obtained sample (silicon nitride ceramic base material) was polished (mirror polishing), and further annealed at 1700°C for 2 hours. The density and ...
Embodiment 2
[0054] 31.07g of silicon nitride powder and 2.26g of composite sintering aid (Y 2 o 3 , MgO and Sc 2 o 3 The molar ratio is 2:5:2) powder as raw material, absolute ethanol as solvent, placed in a ball mill tank for ball milling for 4 hours, then the dried and sieved mixture was placed in a mold, and dry-pressed at 30MPa to form the obtained The green body was formed by cold isostatic pressing at a pressure of 300 MPa. The obtained ceramic green body was placed in a carbon tube furnace, and the temperature was raised to 900° C. under vacuum conditions, and kept for 2 hours to obtain a silicon nitride ceramic body. Then, the temperature was raised to 1900°C at a heating rate of 10°C / min, held for 2 hours, and the nitrogen pressure was 0.6MPa, and then the temperature was lowered with the furnace to obtain a silicon nitride ceramic matrix material. The surface of the obtained sample was polished (mirror polishing), and further annealed at 1800°C for 2h, the material density an...
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