Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Preparation method of erasable bulk phase grating

A technology of grating and processing method, which is applied in the field of grating to achieve the effects of flat and smooth surface, multi-grating diffraction function and strong scratch resistance.

Inactive Publication Date: 2021-04-02
UNIV OF SCI & TECH OF CHINA
View PDF3 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At present, there are few reports on the preparation methods of volume phase gratings, especially oxide thin film volume phase gratings.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Preparation method of erasable bulk phase grating
  • Preparation method of erasable bulk phase grating
  • Preparation method of erasable bulk phase grating

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0045] Step 1. Spin-coat a 2.5 μm thick S1813 positive photoresist layer on a tungsten oxide film with a thickness of 260 nm and a size of 1 cm×1 cm, and then bake it on a heating plate at 115° C. for one minute.

[0046] Step 2. Let the intensity be 19.5mW / cm 2 The ultraviolet light is exposed to the photoresist layer through a mask plate with a stripe pattern, the exposure time is 7.5s, and the interval period of the stripes on the mask plate is 8 μm. Then immerse the exposed tungsten oxide film covered with photoresist layer in a developing solution for development, thereby forming a striped photoresist array on the surface of the tungsten oxide film, such as figure 2 .

[0047] Step 3, immerse the tungsten oxide film covered with the striped photoresist array in the dilute sulfuric acid solution with a concentration of 2% wt, and then allow the zinc wire to contact the surface of the film to react for at least 5 minutes. The surface of the tungsten oxide film not covere...

Embodiment 2

[0052] Step 1. Spin-coat a 2.5 μm thick NR9-3000PY negative photoresist layer on a tungsten oxide film with a thickness of 260nm and a size of 1cm×1cm, and then bake it on a heating plate at 120°C for one minute.

[0053] Step 2. Let the intensity be 19.5mW / cm 2 The ultraviolet light is exposed to the photoresist layer through a mask plate with a square pattern, the exposure time is 20s, and the horizontal and vertical intervals of the block shape on the mask plate are both 8 μm. Then, the tungsten oxide film covered with photoresist layer after exposure is immersed in a developing solution for development, thereby forming a square photoresist periodic array on the surface of the tungsten oxide film ( Figure 6 shown). Submerge the tungsten oxide film covered with square photoresist arrays in dilute sulfuric acid solution with a concentration of 2% wt, and then let the zinc wire touch the surface of the film to react for more than 5 minutes. The surface of the tungsten oxide...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides a preparation method of the erasable bulk phase grating. The photoetching technology is combined, the active metal and the acid solution are used for manufacturing the periodicpattern in the oxide film at the normal temperature, and the method is simple. The bulk phase grating prepared by the method is smooth in surface, has lower back-bottom scattering performance than a traditional grooved grating, and has better scratch and damage resistance. Besides the preparation of conventional stripes, various complex periodic patterns can also be prepared, and the diffraction function and application of the grating are expanded. Finally, the periodic structure of the prepared periodic bulk phase grating can be erased through simple annealing in the air, so that repeated processing can be carried out for multiple times, and the production cost is reduced.

Description

technical field [0001] The invention relates to the technical field of gratings, in particular to a preparation method of rewritable volume phase gratings. Background technique [0002] A grating is an optical component with a spatially periodic structure that can split a beam of incident light into multiple beams to form an interference pattern. As one of the most important optical components, gratings are widely used in monochromators, spectrometers, precision measurements, and optical sensors. The preparation methods of traditional gratings can be divided into two types, one is to directly draw periodic stripes on the substrate, and the other is to use optical holography to form periodic stripe patterns on the substrate. The gratings prepared by these two methods have one thing in common. The periodic stripes are all on the upper surface of the substrate, which is called relief grating or grooved grating. Due to the inevitable introduction of errors and irregularities o...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): G02B5/18
CPCG02B5/1857
Inventor 邹崇文陈宇粮胡昌隆张国斌
Owner UNIV OF SCI & TECH OF CHINA
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com