Grating structure writing method of short-wave range reflective volume grating

A grating structure and reflective technology, which is applied in the field of diffractive optical element preparation, can solve problems such as difficulties in short-wave preparation, and achieve the effects of ensuring stability, low processing cost, and simple structure

Inactive Publication Date: 2021-04-02
SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
View PDF11 Cites 4 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Due to the limitation of exposure wavelength and PTR absorption line, there are still difficulties in short-wave preparation
Zhang Xiaofu, Chen Zhenyi and others proposed "Preparation method of multi-wavelength volume Bra

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Grating structure writing method of short-wave range reflective volume grating
  • Grating structure writing method of short-wave range reflective volume grating
  • Grating structure writing method of short-wave range reflective volume grating

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0037] Embodiment 1: The preparation wavelength of the prism coupling exposure method is 450±0.5nm reflective volume grating, the specific steps are as follows:

[0038] (1) The exposure wavelength λ of the provided parallel UV light 2,3 曝 = 325nm.

[0039] (2) The incident surface 8 and the outgoing surface 10 of the PTR glass 9 to be exposed are polished, and the refractive index of the PTR glass 9 is n under the exposure wavelength 325nm 1 =1.528, the refractive index n at the grating wavelength of 450nm av =1.512

[0040] (3) Calculate the exposure angle θ 0 is 45.6°. Choose base angle θ 2 isosceles prism 1 of 45.6°, its refractive index is n 2=1.528, the two isosceles surfaces 4 and 5 of the triangular prism 1 are plated with a 325nm ultraviolet anti-reflection coating to increase the transmittance of 325nm.

[0041] (3) Use matching liquid 7 to bond the bottom edge 6 of the triangular prism with the incident surface 8 of the PTR glass to prevent light reflection a...

Embodiment 2

[0044] Embodiment 2: Prepare a reflective volume grating with a central wavelength of 376±0.5 nm by means of through-beam exposure.

[0045] (1) Polish the two incident surfaces 8 of the PTR glass 9 to be exposed.

[0046] (2) The refractive index n of PTR glass 9 at the use wavelength of 376nm av =1.52, calculate the exposure angle θ 0 is 59.8°, according to the refractive index, the incident angle θ 1 =49.85°.

[0047] (3) Use two beams of ultraviolet parallel light 2,3 with θ 1 The angle of =49.85° is directed onto the PTR glass 9, and after a certain dose of ultraviolet exposure, the exposure is stopped.

[0048] (4) After subsequent heat treatment and cutting, the first sample of the reflective volume grating is prepared, and its central wavelength is tested, and the steps (2) to (4) are continuously operated to adjust the exposure angle and the central wavelength test, so that the central wavelength falls within range of needs.

[0049] The method of the present in...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
Wavelengthaaaaaaaaaa
Wavelengthaaaaaaaaaa
Login to view more

Abstract

The invention provides a grating structure writing method of a short-wave range reflective volume grating. The method comprises a prism coupling exposure method and a correlation exposure method. Thecentral wavelength of the reflective volume grating prepared by using the grating structure writing method can reach 325nm-650nm. The method provided by the invention provides a new thought for the development of the short-wavelength reflective volume grating, and compared with the existing preparation technology, the technical field of short wavelength is broadened, so that the method has great practical application value in the fields of semiconductor laser wave locking, laser beam combination and the like.

Description

Technical field: [0001] The invention relates to a method for preparing a diffractive optical element, in particular to a method for writing a grating structure of a short-wave reflective volume grating based on photorefractive glass. Background technique: [0002] Semiconductor lasers have the advantages of high efficiency, small size, long life, and low cost, and are widely used in fields such as measurement and communication. However, ordinary semiconductor lasers have problems such as wide linewidth and easy drift of wavelength with temperature changes. Narrow bandwidth frequency-stabilized semiconductor lasers play a key role in high-tech product development and basic research, so the linewidth of semiconductor lasers The development of narrowing and frequency stabilization technology is particularly important. In recent years, reflective volume gratings based on PTR glass have excellent reflection efficiency, strong Bragg wavelength selection and angle selection chara...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): G02B5/18
CPCG02B5/1857
Inventor 晋云霞孙静孔钒宇何冬兵邵建达
Owner SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap