Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

MXene electromagnetic shielding fabric as well as preparation method and application thereof

An electromagnetic shielding and fabric technology, applied in textiles and papermaking, physical treatment, fiber treatment, etc., can solve the problems of poor durability and poor electromagnetic shielding effect, and achieve the improvement of wave absorption performance, protection of human health, and skin-friendly fabrics. excellent effect

Active Publication Date: 2021-04-16
DONGHUA UNIV
View PDF7 Cites 4 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The technical problem to be solved by the present invention is to provide a kind of MXene electromagnetic shielding fabric and its preparation method and application, to overcome the defects of poor electromagnetic shielding effect and poor durability of electromagnetic shielding fabric in the prior art

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • MXene electromagnetic shielding fabric as well as preparation method and application thereof
  • MXene electromagnetic shielding fabric as well as preparation method and application thereof
  • MXene electromagnetic shielding fabric as well as preparation method and application thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0044] (1) The preparation process of MXene:

[0045] Fully stir the etching solution of 1.6g LiF, 19.25g HCl, and 5.5mL ultrapure water, and slowly add 1g MAX phase (Ti 3 AlC 2 ) powder, the reaction temperature is 27°C, the stirring rate is 700r / min, and the stirring is continued for 24h until the etching is complete. Centrifuge several times at 3500r / min for washing until the pH of the supernatant is close to 7. Then the obtained precipitate was fully dispersed in deionized water, centrifuged at 3500r / min for 5min to collect the upper black liquid, which was the MXene dispersion. figure 2 The XRD pattern of the MXene prepared in Example 1 shows that the MXene is completely etched.

[0046] (2) Fabric pretreatment:

[0047] Divide 2.5×2.5cm 2 Pure cotton cloth (thickness 2mm) is put into the plasma processor, and setting power is 60W, and processing time is 5min, in O 2 The pure cotton cloth is pretreated under the atmosphere.

[0048] (3) Put the pure cotton cloth p...

Embodiment 2

[0054] (1) The preparation process of MXene:

[0055] Fully stir the etching solution of 1g LiF, 12.5g HCl, and 5.5mL ultrapure water, and slowly add 1g MAX phase (Ti 3 AlC 2) powder, the reaction temperature is 25°C, the stirring rate is 650r / min, and the stirring is continued for 22h until the etching is complete. Wash by centrifugation several times at 3000r / min until the pH of the supernatant is close to 7. Then the obtained precipitate was fully dispersed in deionized water, centrifuged at 3000r / min for 3min to collect the upper black liquid, which was the MXene dispersion.

[0056] (2) Fabric pretreatment:

[0057] Divide 2.5×2.5cm 2 The pure linen (thickness 3mm) is put into the plasma processor, and the set power is 50W, and the processing time is 3min. 2 Pure sackcloth is pretreated under atmosphere.

[0058] (3) Put the pretreated pure sackcloth in the step (2) into the petri dish containing the 7.5mg / mLMXene / water dispersion obtained in the step (1), soak it f...

Embodiment 3

[0064] (1) The preparation process of MXene:

[0065] Fully stir the etching solution of 2g LiF, 30g HCl, and 5.5mL ultrapure water, and slowly add 1g MAX phase (Ti 3 AlC 2 ) powder, the reaction temperature is 30°C, the stirring speed is 750r / min, and the stirring is continued for 26h until the etching is complete. Centrifuge several times at 4000r / min to wash until the pH of the supernatant is close to 7. Then the obtained precipitate was fully dispersed in deionized water, centrifuged at 4000r / min for 8min to collect the upper black liquid, which was the MXene dispersion.

[0066] (2) Fabric pretreatment:

[0067] Divide 2.5×2.5cm 2 Bamboo fiber cloth (thickness 4mm) is put into the plasma processor, and setting use power is 70W, and processing time is 8min, and in O 2 Bamboo fiber cloth is pretreated under atmosphere.

[0068] (3) Put the pretreated bamboo fiber cloth in step (2) into the petri dish containing the 10mg / mL MXene / water dispersion obtained in step (1), ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
electrical conductivityaaaaaaaaaa
electrical resistanceaaaaaaaaaa
Login to View More

Abstract

The invention relates to an MXene electromagnetic shielding fabric as well as a preparation method and application thereof. The method comprises the following steps of carrying out plasma pretreatment on a flexible fabric substrate, dipping in an MXene dispersion liquid, taking out, drying, and carrying out low-temperature annealing treatment under a CO2 condition. The electromagnetic shielding fabric has good flexibility, washing resistance and electromagnetic shielding characteristics.

Description

technical field [0001] The invention belongs to the field of electromagnetic shielding materials and their preparation and application, in particular to an MXene electromagnetic shielding fabric and its preparation method and application. Background technique [0002] With the rapid development of modern electronic technology, electronic devices and wireless communication equipment are widely used, resulting in more and more electromagnetic radiation and interference, making the space electromagnetic environment increasingly complex. Electromagnetic radiation has become a new type of pollution after noise, water and air pollution. It not only affects the information security of communication equipment and the normal operation of electronic equipment, but also endangers human health. Therefore, research on new electromagnetic shielding materials has become an integral part of protecting electronic components and humans from electromagnetic interference. [0003] The metal an...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): D06M10/00D06M10/02D06M10/06
Inventor 侯成义刘芮吴钦鑫王宏志李耀刚张青红
Owner DONGHUA UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products