Vacuum sealing reflecting screen hearth structure of vertical high-temperature furnace

A technology of vacuum sealing and furnace structure, which is applied in the field of annealing furnace and high temperature oxidation furnace, can solve the problems that the application of high temperature furnace cannot be realized, and achieve the effects of ensuring safety and product qualification rate, avoiding the influence of high temperature, and reducing costs

Pending Publication Date: 2021-05-28
赛瑞达智能电子装备(无锡)有限公司
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The existing conventional furnace structure is usually applied at 800-1200°C. The traditional method is to use furnace wire to be wound into a spiral shape, which is composed of insulation and outsourcing insulation cotton materials. Its structure and material cannot be used in high-temperature furnaces.

Method used

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  • Vacuum sealing reflecting screen hearth structure of vertical high-temperature furnace
  • Vacuum sealing reflecting screen hearth structure of vertical high-temperature furnace
  • Vacuum sealing reflecting screen hearth structure of vertical high-temperature furnace

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no. 2 example

[0033] In the second embodiment, the heat shield 6 of the furnace cover, the heat shield 7 of the furnace shell, and the heat shield 8 of the furnace bottom are all composed of heat shields 14 stacked at intervals. Among them, the interval is generally between 8-10mm. This setting can firstly facilitate the formation of a labyrinth-shaped sealing seam. Second, it can also prevent the heat shields between each layer from affecting each other, because each group of heat shields The material of the heat shield 14 in the direction from the inside to the outside is changed, for example, from the inside to the outside, it is tungsten, molybdenum, stainless steel, and the material type can be two or more, depending on the maximum temperature in the furnace And the heat resistance of the heat shield material, in addition, the material selection according to the temperature also reduces the cost.

[0034] The heat shield 14 is installed on the heat shield mounting plate 16 through the ...

no. 3 example

[0036] In the third embodiment, based on the first embodiment, the outer part of the heater electrode 10 is sleeved with an electrode insulating water-cooling sealing sleeve 18, the heater electrode 10 and the electrode insulating water-cooling sealing sleeve 18 are sealed by a sealing ring, and the electrode insulating water-cooling sealing sleeve 18 It is sealed and solidified with the furnace cover 1 through a sealing ring, and a wiring assembly 19 is provided at the end of the heater electrode 10 for external power supply.

no. 4 example

[0037] In the fourth embodiment, based on the first embodiment, a furnace shell vacuum tube 12 is set through the furnace shell heat shield 7 and the furnace shell 2 to form a vacuum state in the vacuum-sealed furnace, and a furnace shell intake pipe 13 is used for Fill inert gas into the vacuum-sealed furnace, wherein the inert gas is Ar 2 or N 2One of. After evacuation to form a vacuum, the inert gas is then filled to further ensure that the furnace is in an oxygen-free state, and protect the heater 9 and the heat shield 6 of the furnace cover, the heat shield 7 of the furnace shell, and the heat shield 8 of the furnace bottom. performance.

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Abstract

The invention relates to a vacuum sealing reflecting screen hearth structure of a vertical high-temperature furnace. The vacuum sealing reflecting screen hearth structure is characterized in that a furnace cover, a furnace shell and a furnace bottom flange are fastened through bolts and sealed through sealing rings; a vacuum sealing hearth defined by a sealing flange and a process pipe is hermetically mounted in the furnace bottom flange; a process cavity defined by the process pipe is formed in the vacuum sealing hearth, and is used for carrying out the technological process of a process piece; a furnace cover heat insulation screen, a furnace shell heat insulation screen and a furnace bottom heat insulation screen are arranged in the vacuum sealing hearth; labyrinth-shaped sealing joints are formed among the furnace cover heat insulation screen, the furnace shell heat insulation screen and the furnace bottom heat insulation screen; a heating cavity is formed among the furnace cover heat insulation screen, the furnace shell heat insulation screen, the furnace bottom heat insulation screen and the process pipe; and a heater is arranged in the heating cavity. The furnace cover heat insulation screen, the furnace shell heat insulation screen and the furnace bottom heat insulation screen which are formed by stacking multiple layers of heat insulation screens at intervals are arranged in the vacuum sealing hearth, and the labyrinth-shaped sealing joints in the three sets of heat insulation screens permit heat diffused outwards in the vertical high-temperature oxidation furnace to be reflected, so that the temperature reached by heating can be stably kept, the energy consumption is reduced, and the high-temperature influence on assemblies outside the furnace is also reduced.

Description

technical field [0001] The invention relates to the technical field of high-temperature oxidation furnaces and annealing furnaces, in particular to a furnace chamber structure of a vacuum-sealed reflective screen for a vertical high-temperature furnace. Background technique [0002] As a typical representative of the third-generation semiconductor materials, SIC is an ideal semiconductor material for high-temperature, high-frequency, radiation-resistant, and high-power applications; since silicon carbide power devices can significantly reduce the energy consumption of electronic equipment, silicon carbide devices are also Known as the "green energy device" that drives the "new energy revolution". The main characteristics of the process of diffusion, oxidation and annealing of SIC materials are the need for high temperature or vacuum plus high temperature and process gas conditions, especially the high temperature is generally 1400 ℃ -2000 ℃, which is the second highest in th...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): F27D1/00F27D1/18F27D9/00F27D11/00F27D21/00
CPCF27D1/0033F27D1/1808F27D9/00F27D11/00F27D21/0014F27D2009/0013
Inventor 张海林吴季浩刘国霞滕玉朋
Owner 赛瑞达智能电子装备(无锡)有限公司
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