Semiconductor processing waste gas treatment equipment

Abstract

The invention relates to the technical field of general semiconductors, and provides semiconductor process waste gas treatment equipment which comprises a treatment container, a first gas inlet pipe and a second gas inlet pipe, and a treatment cavity is limited by the treatment container; the first gas inlet pipe communicates with the treatment cavity and is used for introducing to-be-treated gas into the treatment cavity; the second gas inlet pipe sleeves the outer side of the first gas inlet pipe and is connected to the treatment container, the second gas inlet pipe is provided with a gas inlet, a gas inlet interlayer is formed between the second gas inlet pipe and the first gas inlet pipe, and the gas inlet interlayer communicates with the treatment cavity so as to introduce first auxiliary gas into the treatment cavity; and at least one of temperature and flow rate of the first auxiliary gas is higher than that of the gas to be treated. According to the semiconductor manufacturing process waste gas treatment equipment, the problem that blockage is easily caused by dust accumulation at the outlet end of the first gas inlet pipe is solved, the cleaning and maintenance period is prolonged, the labor intensity of cleaning is reduced, the equipment cleaning and maintenance cost is reduced, and the production efficiency can be improved and the production cost can be reduced.

Description

technical field [0001] The invention relates to the field of pan-semiconductor technology, in particular to waste gas treatment equipment for semiconductor manufacturing processes. Background technique [0002] In the production process of the pan-semiconductor industry, a large amount of chemicals and special gases are used, and the production process continues to generate a large amount of process waste gas of toxic and harmful gases. Process waste gas needs to be collected, treated and discharged synchronously with the production process. The waste gas treatment system and equipment are an integral part of the customer's production process. Their safety and stability are directly related to the customer's capacity utilization rate, product yield rate, employee occupational health and ecosystem. Therefore, on the production line (especially 8-inch and 12-inch wafers), electronic waste gas treatment equipment (local scrubber) has been used to treat the waste gas generated ...

AI Technical Summary

Problems solved by technology

For this reason, the present invention proposes a semiconductor process waste gas treatment equipment, which solves the problem that the dust accumulation at the outlet end of the first air intake pipe is easy to cause blockage, promotes the treatment chamber to be in a smooth state, slows down the blockage of the first air intake pipe and the treatment chamber, and prolongs the cleaning time. Maintenance cycle, reduce the labor intensity of cleaning, reduce equipment cleaning and maintenance costs, help to improve production efficiency and reduce production costs

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