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Bipolar high-voltage pulse power supply capable of generating uniform low-temperature plasma

A high-voltage pulse power supply and low-temperature plasma technology, applied in the field of plasma, can solve the problems of switching loss interference, poor reliability, and high requirements for switching synchronization, and achieve the effects of reducing electromagnetic interference, avoiding oscillation, and reducing the number

Active Publication Date: 2021-06-11
无锡复溪电子科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] Bipolar high-voltage pulses can be generated by multiple techniques, the most direct method is to connect a DC high-voltage power supply to the load through a high-voltage switch, the main circuit adopts a half-bridge or full-bridge structure, and each high-voltage switch has an insulated gate type transistor IGBT Or metal-oxide-semiconductor field-effect transistors MOSFETs are stacked in series. This solution requires high synchronization of switches, and also requires a complex voltage equalization circuit. If individual switches are turned on with a delay, they will be broken down by overvoltage in a short circuit
[0005] Another solution is to use all-solid-state Marx. The most basic idea is to charge the energy storage capacitor in parallel, and then discharge the energy storage capacitor in series to output high-voltage pulses. The all-solid-state Marx avoids the switch in series, and because it has a clamp function, there will be no overvoltage of the switch, the advantage of these two schemes is that they can output standard square wave pulses, however, they both require a large number of semiconductor switches, and because the switches are at different potentials, they also need to isolate the drive circuit, and these switches at the same time It is in a hard switching state when working, and the problems of switching loss and electromagnetic interference are serious, resulting in poor reliability

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  • Bipolar high-voltage pulse power supply capable of generating uniform low-temperature plasma
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Embodiment Construction

[0018] The specific embodiments of the present invention will be further described below in conjunction with the accompanying drawings.

[0019] A bipolar high-voltage pulse power supply that generates uniform low-temperature plasma, such as figure 1 and 2 As shown, it includes rectification and filtering module, two resonant charging modules with the same circuit structure, double primary winding pulse transformer and control module. The charging module and the rectification and filtering module can use commercially available rectification units and filter units, such as figure 2 As shown in , the rectifier unit includes four rectifier diodes, thereby forming a rectifier bridge to rectify the alternating current, and the filter unit includes a filter capacitor C1, which is connected between the positive and negative outputs of the rectifier unit. The dual primary winding pulse transformer includes a first primary coil Lp1, a second primary coil Lp2 and a secondary coil Ls,...

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Abstract

The invention discloses a bipolar high-voltage pulse power supply capable of generating uniform low-temperature plasma, and relates to the field of low-temperature plasmas. The bipolar high-voltage pulse power supply comprises a rectification filtering module, two resonance charging modules, a double-primary winding pulse transformer and a control module, each resonance charging module comprises a resonance inductor, a resonance diode, a resonance capacitor and a semiconductor switch, wherein one ends of the resonance inductors serve as input anode ends of the resonant charging modules, second ends of the semiconductor switches serve as an input cathode end and an output cathode end of the resonance charging modules, the other ends of the resonance capacitors serve as output anode ends of the resonant charging modules, one end of a secondary coil, the first end of a first primary coil and the first end of a second primary coil are dotted terminals respectively, the control module obtains bipolar high-voltage pulses on the secondary coil by controlling alternate conduction of the two semiconductor switches, the number of the semiconductor switches is reduced, and uniform low-temperature plasmas are generated more stably.

Description

technical field [0001] The invention relates to the field of low-temperature plasma, in particular to a bipolar high-voltage pulse power supply for generating uniform low-temperature plasma. Background technique [0002] Low temperature plasma is the fourth state of matter after solid state, liquid state and gas state. The temperature of electrons in low temperature plasma is much higher than the temperature of ions and neutral particles. The electrons are enough to excite, dissociate and ionize reactant molecules, and the entire reaction system Therefore, low-temperature plasma has broad application prospects in the fields of material surface modification, waste gas treatment, fluid control and biomedicine. [0003] In the prior art, low-frequency or medium-frequency sinusoidal high-voltage drive is used for low-temperature plasma. Although sinusoidal drive has some advantages, pulse-driven low-temperature plasma has more advantages in terms of energy efficiency and dischar...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H02M9/04H03K3/57
CPCH03K3/57Y02B70/10
Inventor 王永刚孙懿凌钧
Owner 无锡复溪电子科技有限公司
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