Eureka AIR delivers breakthrough ideas for toughest innovation challenges, trusted by R&D personnel around the world.

Forming process with anti-fingerprint, anti-scratch and wear-resistant glass substrate etching effect

A technology of glass substrate and forming process, which is applied in the field of glass substrate etching effect forming process, which can solve the problems of residual anti-fingerprints on the back cover of glass mobile phones, which is not conducive to the production of equipment manufacturers, and the back cover of glass mobile phones is not resistant to wear, etc. , to achieve stable product quality, easy control, and high production yield

Active Publication Date: 2021-07-09
佛山犀马精细化工有限公司
View PDF7 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] Most of the existing chemical etching solutions are only aimed at the aesthetic treatment of the surface of the glass mobile phone back cover, and do not solve the problem that the glass mobile phone back cover is easy to leave anti-fingerprints
And in the actual use process, the glass mobile phone back cover is not wear-resistant, which is not conducive to the production of equipment manufacturers

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Forming process with anti-fingerprint, anti-scratch and wear-resistant glass substrate etching effect
  • Forming process with anti-fingerprint, anti-scratch and wear-resistant glass substrate etching effect
  • Forming process with anti-fingerprint, anti-scratch and wear-resistant glass substrate etching effect

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0026] The present invention is an anti-fingerprint, anti-scratch and wear-resistant glass substrate etching effect molding process, comprising the following steps:

[0027] S1, prepare etching solution according to the following components by weight: 5-10 parts of ammonium bifluoride, 5-10 parts of sodium fluoride, 10-15 parts of p-toluenesulfonic acid, 10-15 parts of methanesulfonic acid, 2-6 parts of oxyethylene ether, 2-4 parts of sodium polyacrylate, 2-10 parts of EDTA, 90-95 parts of water, first grind and mix ammonium bifluoride and sodium fluoride to form a mixture 1; then p-toluenesulfonic acid and Grind and mix methanesulfonic acid evenly to form mixture 2; then stir polyoxyethylene lauryl ether and sodium polyacrylate to form mixture 3; finally raise the temperature of water to 50°C, and while stirring, successively mix mixture 3, EDTA, and mixture 2 and mixture 1 were added to water (after stirring until there was no precipitation, another substance was added), and...

Embodiment 2

[0035] The etching solution is prepared according to the following components in parts by weight: 7 parts of ammonium bifluoride, 5 parts of sodium fluoride, 10 parts of p-toluenesulfonic acid, 13 parts of methanesulfonic acid, 2 parts of polyoxyethylene lauryl ether, and 2 parts of sodium polyacrylate. parts, 10 parts of EDTA, and 90 parts of water; when frosting, the temperature of the etching solution is kept at 28°C, and the temperature difference of the etching solution is controlled within 3%.

[0036] Carry out experiment to glass base material with the etching solution of embodiment two and the molding process of embodiment one, and carry out performance test to the surface of glass base material, obtain following result:

[0037] One is that there is no fingerprint residue on the surface of the glass substrate, the other is that the thickness of the honeycomb-like particle layer measured by the instrument is 45nm, and the hardness is 5H; the third is that the dynamic f...

Embodiment 3

[0039] The etching solution is prepared according to the following components in parts by weight: 5 parts of ammonium bifluoride, 10 parts of sodium fluoride, 15 parts of p-toluenesulfonic acid, 10 parts of methanesulfonic acid, 4 parts of polyoxyethylene lauryl ether, and 4 parts of sodium polyacrylate parts, 7 parts of EDTA, and 93 parts of water; when frosting, the temperature of the etching solution is kept at 32°C, and the temperature difference of the etching solution is controlled within 3%.

[0040] With the etching solution of embodiment three and the molding process of embodiment one, the glass substrate is tested, and the performance test is carried out on the surface of the glass substrate, and the following results are obtained:

[0041] One is that there is no fingerprint residue on the surface of the glass substrate, the other is that the thickness of the honeycomb-like particle layer measured by the instrument is 47nm, and the hardness is 6H; the third is that t...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
Thicknessaaaaaaaaaa
Surface energyaaaaaaaaaa
Drop angleaaaaaaaaaa
Login to View More

Abstract

The invention relates to the technical field of glass deep processing, and particularly discloses a forming process with an anti-fingerprint, anti-scratch and wear-resistant glass substrate etching effect, which is mainly applied to chemical etching of a glass mobile phone back cover. A honeycomb-like particle layer is formed on the surface of the glass mobile phone back cover to disperse lines of fingerprints as much as possible, so that an anti-fingerprint effect is achieved; meanwhile, the honeycomb-like particle layer is good in wear resistance and can be used for a long time without falling off. Besides, organic acid such as p-toluenesulfonic acid and methanesulfonic acid is adopted as acid in the etching solution and combined with fluoride salt (ammonium hydrogen fluoride and sodium fluoride) to form effective components in the etching solution, production is stable during frosting, and waste liquid obtained after frosting is environmentally friendly; in addition, the etching liquid is low in price, the etching process is easy to control, the production yield is high, and the product quality is stable.

Description

technical field [0001] The invention relates to the technical field of glass deep processing, in particular to a glass substrate etching effect molding process with anti-fingerprint, anti-scratch and abrasion resistance. Background technique [0002] At present, more and more mobile phone manufacturers have begun to convert the back cover material of the mobile phone into a glass material. The glass mobile phone back cover can improve the mobile phone's ability to receive signals, and in the production process, by using chemical etching liquid to etch the glass mobile phone back cover, various patterns can be obtained, which further makes the mobile phone look more beautiful , more upscale. [0003] Most of the existing chemical etching solutions are only aimed at the aesthetic treatment of the surface of the glass mobile phone back cover, and do not solve the problem that the glass mobile phone back cover is easy to leave anti-fingerprints. And in the actual use process, ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): C03C15/00
CPCC03C15/00Y02A30/00
Inventor 黄忠军李劲文
Owner 佛山犀马精细化工有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Eureka Blog
Learn More
PatSnap group products