Polarization characteristic detection device and detection method for non-planar transparent element

Abstract

The invention discloses a polarization characteristic detection device and a detection method for a non-planar transparent element. The device comprises polarization characteristic measurement equipment, matching liquid, a container and a clamping piece, wherein the matching liquid is arranged in the container, and the clamping piece is used for clamping the non-planar transparent element and completely immersing the non-planar transparent element in the matching liquid in the container; the matching liquid and the non-planar transparent element are matched for use, so that the emitting direction of the measurement light beam after passing through the matching liquid and the non-planar transparent element is consistent with the emitting direction of the measurement light beam after passing through the planar transparent element independently; the polarization characteristic measurement device is used for detecting the overall polarization characteristic of the non-planar transparent element used in cooperation with the matching liquid and obtaining the polarization characteristic of the non-planar transparent element based on the overall polarization characteristic. The non-planar transparent element is completely immersed in the matching liquid, so that the emitting direction of the measurement light beam after passing through the matching liquid and the non-planar transparent element is consistent with the emitting direction of the measurement light beam after passing through the planar transparent element independently, and the effect of the planar transparent element is further achieved.

Description

technical field [0001] The invention relates to the technical field of polarization detection, in particular to a polarization characteristic detection device and detection method of a non-planar transparent element. Background technique [0002] Stress birefringence (SBR) of optical components caused by residual stress, defects, and mechanical clamping can affect the polarization state of light, which is a consideration in polarization-dependent and precision optics applications. Especially for immersion optical lithography, the level of birefringence of the optical components is a key factor affecting the desired intensity of polarized light (IPS), a parameter related to the critical dimension of the wafer. At present, for the high spatial resolution birefringence distribution detection of optical materials and components, the general methods include imaging method, scanning method and micro-detection device array method. However, these systems are generally aimed at samp...

AI Technical Summary

Problems solved by technology

However, there are two major problems in this device and other similar methods of correcting the optical path: one is that the added correction device (such as L1 in this example) inevitably has stress birefringence itself, which increases a new system error, and Because the birefringence distribution of this part of the device itself is also difficult to measure (because of the surface shape), this error is difficult to evaluate; secondly, due to the existence of aberrations, this correction method cannot actually guarantee strict parallel incident and parallel exit. A sample theoretically needs to be matched with a suitable L1 (the aberration of the two should be compensated as much as possible)

[0007] Method 1: Introduce new, difficult-to-measure systematic errors, and due to the influence of aberrations, the optical path cannot be perfectly corrected, and different samples need to be matched with different correction lens

[0008]Method 2: Significantly increases the complexity of optical, mechanical and electronic control, and also has the problem of long measurement time

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