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SiF4 and HF mixed gas separation method and system

A technology of mixed gas and separation method, applied in the field of separation method and system of SiF4 and HF mixed gas, can solve the problems of air pollution, waste of resources, large energy consumption, etc., and achieve the effect of simple separation process and energy saving

Active Publication Date: 2021-08-10
SICHUAN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] In the process of using silicon tetrafluoride and hydrogen to prepare polysilicon, a large amount of hydrogen fluoride will be produced, and this large amount of hydrogen fluoride gas is mixed with silicon tetrafluoride gas. If this mixed gas is discharged directly, it will cause air pollution and waste of resources.
In the existing technology, it is difficult to obtain high-purity hydrogen fluoride products by means of separation and purification of hydrogen fluoride, and the separated hydrogen fluoride needs to be further processed before it can be put into the above-mentioned industrial applications, and a large amount of energy will be consumed in the separation process

Method used

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  • SiF4 and HF mixed gas separation method and system

Examples

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Comparison scheme
Effect test

Embodiment 1

[0033] A method for separating SiF4 and HF mixed gas, relates to the above-mentioned gas separation system, and the method comprises the following steps:

[0034] S1, S1, pass the mixed gas of silicon tetrafluoride and hydrogen fluoride and hydrogen gas into the microwave heating device 1, the volume of the hydrogen gas is 4 times the volume of the mixed gas of silicon tetrafluoride and hydrogen fluoride, and the purity of the hydrogen gas is 99.9999%. The microwave heating device 1 rapidly heats the mixed gas of silicon tetrafluoride, hydrogen fluoride and hydrogen to 600°C;

[0035] S2, passing the mixed gas heated by the microwave heating device 1 and the silicon generated into the gas-solid separation device 2 for separation;

[0036] S3, passing the mixed gas separated by the gas-solid separation device 2 into the condenser 3 for condensation, the condensation temperature of the condenser 3 is -11°C, and the pressure is 0.6MPa;

[0037] S41: Pass the remaining gas conden...

Embodiment 2

[0042] A method for separating SiF4 and HF mixed gas, relates to the above-mentioned gas separation system, and the method comprises the following steps:

[0043] S1, S1, pass the mixed gas of silicon tetrafluoride and hydrogen fluoride and hydrogen gas into the microwave heating device 1, the volume of the hydrogen gas is 8 times the volume of the mixed gas of silicon tetrafluoride and hydrogen fluoride, and the purity of the hydrogen gas is 99.99999%. The microwave heating device 1 rapidly heats the mixed gas of silicon tetrafluoride, hydrogen fluoride and hydrogen to 1200°C;

[0044] S2, passing the mixed gas heated by the microwave heating device 1 and the silicon generated into the gas-solid separation device 2 for separation;

[0045] S3. Pass the mixed gas separated by the gas-solid separation device 2 into the condenser 3 for condensation, the condensation temperature of the condenser 3 is -13°C, and the pressure is 0.53MPa;

[0046] S41: Pass the remaining gas conden...

Embodiment 3

[0051] A method for separating SiF4 and HF mixed gas, relates to the above-mentioned gas separation system, and the method comprises the following steps:

[0052] S1. Pass the mixed gas of silicon tetrafluoride and hydrogen fluoride and hydrogen gas into the microwave heating device 1, the volume of the hydrogen gas is 5 times the volume of the mixed gas of silicon tetrafluoride and hydrogen fluoride, and the purity of the hydrogen gas is 99.99999%. The microwave heating device 1 rapidly heats the mixed gas of silicon tetrafluoride, hydrogen fluoride and hydrogen to 600°C;

[0053] S2, passing the mixed gas heated by the microwave heating device 1 and the silicon generated into the gas-solid separation device 2 for separation;

[0054] S3, passing the mixed gas separated by the gas-solid separation device 2 into the condenser 3 for condensation, the condensation temperature of the condenser 3 is -13°C, and the pressure is 0.6MPa;

[0055] S41: Pass the remaining gas condensed...

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Abstract

The invention discloses a SiF4 and HF mixed gas separation method and system, the SiF4 and HF mixed gas and hydrogen are introduced into a microwave heating device together, the mixed gas of silicon tetrafluoride, hydrogen fluoride and hydrogen is rapidly heated to 600-1200 DEG C through the microwave heating device, and silicon and hydrogen fluoride gas is generated; enabling generated silicon and hydrogen fluoride gas and unreacted silicon tetrafluoride gas and hydrogen to enter a gas-solid separation device together, separating silicon out, and introducing residual gas into a condenser together; the hydrogen fluoride gas is condensed into hydrogen fluoride condensed liquid, the hydrogen fluoride condensed liquid enters a rectifying tower to be further purified to obtain high-purity hydrogen fluoride, and hydrogen and silicon tetrafluoride gas which are not reacted completely return to the microwave heating device to be reacted; and hydrogen and silicon tetrafluoride gas are circulated in the system, so that silicon tetrafluoride is continuously reduced to generate hydrogen fluoride, and high-purity hydrogen fluoride is obtained through condensation and rectification.

Description

technical field [0001] The invention relates to the technical field of fluorine chemical industry, in particular to a method and system for separating SiF4 and HF mixed gas. Background technique [0002] Anhydrous hydrogen fluoride (hydrogen fluoride) has a boiling point of 19.5°C under normal pressure. When it is lower than 19.5°C, it is a colorless fuming liquid. It is easy to polymerize and very volatile. It emits white smoke when it is placed in the air, and it emits violently when dissolved in water. Heat into hydrofluoric acid; it is highly corrosive and can corrode glass and silicate to generate gaseous silicon tetrafluoride, but it does not corrode polyethylene, lead and platinum; hydrogen fluoride is the production of refrigerant "Freon", Raw materials for fluorine-containing resins, organic fluorides, and fluorine. Hydrogen fluoride can be used as a catalyst for organic synthesis such as alkylation, polymerization, condensation, and isomerization in chemical produ...

Claims

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Application Information

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IPC IPC(8): C01B7/19C01B33/03
CPCC01B7/193C01B7/195C01B33/03
Inventor 罗建洪屈吉艳叶毅彭沐森
Owner SICHUAN UNIV
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