Terahertz material micro-nano defect detection device and method based on multi-frequency point information fusion
Patent Information
- Authority / Receiving Office
- CN · China
- Current Assignee / Owner
- THE 41ST INST OF CHINA ELECTRONICS TECH GRP
- Publication Date
- 2021-08-20
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Abstract
Description
technical field
[0001] The invention belongs to the technical field of terahertz testing, and in particular relates to a micro-nano defect detection device and method for terahertz materials based on multi-frequency point information fusion. Background technique
[0002] The statements in this section merely provide background information related to the present invention and do not necessarily constitute prior art.
[0003] Based on the application needs of material micro-nano defect detection, as an emerging micro-nano defect detection analyzer that can break through the diffraction limit, the resolution of the scattering terahertz microscopic imager is only related to the size of the micro-probe in the system, and is not affected by it. The restriction of the incident light wavelength is the most promising micro-nano defect detection analyzer at present. However, most of the current scattering terahertz microscopic imagers are based on optical sources, which are limited b...