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Nano laser direct writing objective lens

A technology of laser direct writing and objective lens, which is applied in the field of lenses, can solve the problems of increasing the angle of light collected by the first lens, unfavorable lens processing, and increasing the difficulty of coating, so as to reduce difficulty, reduce manufacturing cost, and increase numerical aperture. Effect

Active Publication Date: 2022-05-24
ZHEJIANG UNIV +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In order to increase the numerical aperture NA to about 1.3 to achieve high resolution, the microscope objective lens can usually change the working medium from air to liquid with a refractive index of about 1.5, which can increase the angle of light collected by the first lens, and needs to be designed. One lens is a super hemispherical lens, which is not good for lens processing, and increases the difficulty of coating, thereby increasing the cost of the objective lens

Method used

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  • Nano laser direct writing objective lens
  • Nano laser direct writing objective lens
  • Nano laser direct writing objective lens

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0058] like Figure 1-5 As shown, a nano-laser direct writing objective lens includes a first group A of negative refractive power, a second group B of positive refractive power, a diaphragm, and a third group of positive refractive power, which are sequentially arranged along the incident direction of light. group C;

[0059] The focal length of the system in this embodiment is 6.86, and the detailed structural data is as follows:

[0060]

[0061]

[0062] The surface serial numbers in the table are set sequentially along the direction of light incidence;

[0063] A number marked with * means the surface is aspheric. The aspheric formula is as follows:

[0064]

[0065] Among them, c is the radius of curvature, and the aspheric coefficient is as follows:

[0066]

[0067]

[0068] The diaphragm is set on the 30th surface;

[0069] The focal length of each group satisfies the following relationship:

[0070] |fA / fB|=1.88;

[0071] |fB / fC|=12.72;

[0072...

Embodiment 2

[0091] like Figure 6-16 As shown, a nano-laser direct writing objective lens includes a first group A of negative refractive power, a second group B of positive refractive power, a diaphragm, and a third group of positive refractive power, which are sequentially arranged along the incident direction of light. group C;

[0092] The focal length of the system in this embodiment is 7.00, and the detailed structural data is as follows:

[0093]

[0094]

[0095]

[0096] The surface serial numbers in the table are set sequentially along the direction of light incidence;

[0097] A number marked with * means the surface is aspheric. The aspheric formula is the same as the formula in Example 1:

[0098] Among them, c is the radius of curvature, and the aspheric coefficient is as follows:

[0099]

[0100] The diaphragm is set on the 31st surface;

[0101] The focal length of each group satisfies the following relationship:

[0102] |fA / fB|=0.72;

[0103] |fB / fC|=...

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Abstract

The invention relates to the lens field, in particular to a nanometer laser direct writing objective lens. Including the first group of negative dioptric powers, the second group of positive dioptric powers, the diaphragm, and the third group of positive dioptric powers arranged in sequence along the light incident direction; wherein the focal lengths of each group satisfy the following relationship: 0.65<|fA / fB|<3.5; 4.0<|fB / fC|<15.0;-120mm<fA<-40mm; 40mm<fB<80mm; 5mm<fC<15mm, where: fA is the focal length of the first group , fB is the focal length of the second group, and fC is the focal length of the third group. The invention provides a high-resolution nano-laser direct writing objective lens with a numerical aperture of NA to about 1.3. The objective lens is an infinity apochromatic type system, and does not need to use a super hemispherical lens, which facilitates the processing of the objective lens and can reduce the manufacturing cost of the objective lens. cost.

Description

technical field [0001] The invention relates to the field of lenses, in particular to a nano-laser direct writing objective lens. Background technique [0002] A lithography machine is a device used to print patterns on substrate materials such as chips, printed circuit boards, masks, flat panel displays, biochips, micromechanical electronic chips, and optical glass flat plates. The chrome glass masks used in traditional photolithography processes need to be provided by specialized suppliers, but in the R&D environment, the mask design often needs to be changed frequently. Maskless lithography overcomes this problem by designing electronic masks in software. Different from the traditional process of lighting through a physical mask, laser direct writing is to control the switch of a series of laser pulses through a computer, and directly expose the photoresist to draw the desired pattern. Laser direct writing technology is usually used for the fabrication of microstructure...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20G02B13/18
CPCG03F7/70241G03F7/70383G02B13/18
Inventor 黄木旺刘旭匡翠方林法官
Owner ZHEJIANG UNIV