Dry type wafer cleaning device for functional ceramic wafers
A functional ceramic and dry technology, which is applied to surface polishing machine tools, machine tools suitable for grinding the edge of workpieces, grinding machines, etc., can solve problems such as not being able to meet large-scale production and processing, workers' health damage, and poor working environment. Achieve the effect of automatically removing defective products, improving the efficiency of cleaning tablets, and improving the efficiency of cleaning tablets
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[0025] The present invention will be further described below in conjunction with the examples, but not as a basis for limiting the present invention.
[0026] Embodiments of the invention
[0027] A dry cleaning device for functional ceramic sheets, as attached Figure 1-3 As shown, a bracket 1 is included, a barrel is arranged above the bracket 1, a convex ring 2 is arranged on the peripheral surface of the barrel, and a driving wheel 3 cooperating with the convex ring 2 is provided on the bracket 1 below the convex ring 2 , the driving wheel 3 is connected with a drive motor 5 through a transmission device 4; the barrel includes a clean section 6, and the two ends of the clean section 6 are respectively connected with a trumpet-shaped discharge section 7 and a feed section 8, wherein the clean The inner walls of the segment 6 and the discharge section 7 are provided with several spirally arranged ribs 9 , and the distance between adjacent ribs 9 is smaller than the minimum ...
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