Semiconductor hydrocarbon cleaning agent and preparation method thereof

A hydrocarbon cleaning agent and semiconductor technology, applied in the preparation of detergent mixture composition, detergent composition, detergent compounding agent, etc., can solve the problems of low VOCs content, achieve good material compatibility, and enhance cleaning performance, superior synergistic effect

Active Publication Date: 2021-10-22
诺而曼环保科技(江苏)有限公司
View PDF6 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] Due to environmental protection requirements and the "Volatile Organic Compound Content Limits of Cleaning Agents" (GB38508-2020), the semiconductor solvent-based cleaning agents commonly used in the market are generally halogenated hydrocarbons or 141B or several compounds, and this type of cleaning agent VOCs content > 1000g / L, exceeding the upper limit of GB38508-2020, so it is necessary to provide a semiconductor cleaning agent with low VOCs content

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Semiconductor hydrocarbon cleaning agent and preparation method thereof
  • Semiconductor hydrocarbon cleaning agent and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0043] A hydrocarbon cleaning agent for semiconductors, made from raw materials containing the following parts by weight: nonane 40kg, 3-butoxy-1-propanol 10kg, HFC-4310mee 1kg, 365AZ-M 0.1kg, diethylene glycol 0.5kg of butyl ether and 0.1kg of fatty alcohol polyoxyethylene ether.

[0044] The preparation method of the hydrocarbon cleaning agent of semiconductor, specifically comprises the following steps:

[0045]S1. Weigh 40kg of nonane, 10kg of 3-butoxy-1-propanol, 1kg of HFC-4310mee, 0.1kg of 365AZ-M, 0.5kg of diethylene glycol butyl ether and 0.1kg of fatty alcohol polyoxyethylene ether;

[0046] S2. At room temperature, first mix nonane and 3-butoxy-1-propanol evenly to prepare mixed solution A;

[0047] S3. At room temperature, mix HFC-4310mee, 365AZ-M, diethylene glycol butyl ether and fatty alcohol polyoxyethylene ether evenly to prepare a mixed solution B;

[0048] S4. At room temperature, pour the mixed solution B into the mixed solution A and stir evenly to prepa...

Embodiment 2

[0051] A hydrocarbon cleaning agent for semiconductors, made from raw materials containing the following parts by weight: nonane 60kg, 3-butoxy-1-propanol 35kg, HFC-4310mee 3kg, 365AZ-M 5.2kg, diethylene glycol 2.75kg of butyl ether and 2.55kg of fatty alcohol polyoxyethylene ether.

[0052] The preparation method of the hydrocarbon cleaning agent of semiconductor, specifically comprises the following steps:

[0053] S1. Weigh 60kg of nonane, 35kg of 3-butoxy-1-propanol, 3kg of HFC-4310mee, 5.2kg of 365AZ-M, 2.75kg of diethylene glycol butyl ether and 2.55kg of fatty alcohol polyoxyethylene ether;

[0054] S2. At room temperature, first mix nonane and 3-butoxy-1-propanol evenly to prepare mixed solution A;

[0055] S3. At room temperature, mix HFC-4310mee, 365AZ-M, diethylene glycol butyl ether and fatty alcohol polyoxyethylene ether evenly to prepare a mixed solution B;

[0056] S4. At room temperature, pour the mixed solution B into the mixed solution A and stir evenly to ...

Embodiment 3

[0059] A hydrocarbon cleaning agent for semiconductors, made from raw materials containing the following parts by weight: 80kg of nonane, 60kg of 3-butoxy-1-propanol, 5kg of HFC-4310mee, 10kg of 365AZ-M, butylene glycol Ether 5kg and fatty alcohol polyoxyethylene ether 5kg.

[0060] The preparation method of the hydrocarbon cleaning agent of semiconductor, specifically comprises the following steps:

[0061] S1. Weigh nonane 80kg, 3-butoxy-1-propanol 60kg, HFC-4310mee 5kg, 365AZ-M10kg, diethylene glycol butyl ether 5kg and fatty alcohol polyoxyethylene ether 5kg;

[0062] S2. At room temperature, first mix nonane and 3-butoxy-1-propanol evenly to prepare mixed solution A;

[0063] S3. At room temperature, mix HFC-4310mee, 365AZ-M, diethylene glycol butyl ether and fatty alcohol polyoxyethylene ether evenly to prepare a mixed solution B;

[0064] S4. At room temperature, pour the mixed solution B into the mixed solution A and stir evenly to prepare the mixed solution C;

[0...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention relates to the field of semiconductor cleaning agents, and particularly discloses a semiconductor hydrocarbon cleaning agent and a preparation method thereof. The hydrocarbon cleaning agent is prepared from the following raw materials in parts by weight: 40-80 parts of a hydrocarbon solvent, 10-60 parts of an alcohol ether solvent, 1-5 parts of a fine particle remover, 0.1-10 parts of a scaling powder remover, 0.5-5 parts of an anti-whitening agent and 0.1-5 parts of a surface tension aid. The preparation method comprises the following steps: S1, weighing the hydrocarbon solvent, the alcohol ether solvent, the fine particle remover, the flux remover, the anti-whitening agent and the surface tension additive in parts by weight; S2, uniformly mixing a hydrocarbon solvent and an alcohol ether solvent to prepare a mixed solution A; S3, uniformly mixing a fine particle removing agent, a scaling powder removing agent, an anti-whitening agent and a surface tension additive to prepare a mixed solution B; S4, pouring the mixed solution B into the mixed solution A, and uniformly stirring to obtain a mixed solution C; and S5, subjecting the mixed solution C to standing treatment, and after the mixed solution C is stable, preparing a hydrocarbon cleaning agent finished product. The hydrocarbon cleaning agent has the advantage of being low in VOCs content.

Description

technical field [0001] The application relates to the technical field of semiconductor cleaning agents, more specifically, it relates to a semiconductor hydrocarbon cleaning agent and a preparation method. Background technique [0002] Semiconductors refer to materials whose electrical conductivity is between conductors and insulators at room temperature. Semiconductors are used in integrated circuits, consumer electronics, communication systems, photovoltaic power generation, lighting, and high-power power conversion. In order to ensure the quality and high reliability of semiconductor devices, the semiconductor devices need to be cleaned before packaging. Semiconductor cleaners are mainly used to clean paraffin wax, grease and grease-like polymer compounds on the surface, as well as metal atoms and metal ions on the surface. [0003] Due to environmental protection requirements and the "Volatile Organic Compound Content Limits of Cleaning Agents" (GB38508-2020), the semic...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): C11D1/72C11D1/825C11D1/83C11D3/18C11D3/20C11D3/24C11D3/36C11D3/44C11D3/60
CPCC11D1/72C11D1/825C11D1/83C11D3/181C11D3/2068C11D3/245C11D3/43C11D3/362C11D3/361C11D11/0047C11D1/146C11D1/667
Inventor 吴爱平郝光磊
Owner 诺而曼环保科技(江苏)有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap