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Resist composition for black matrix and black matrix

A technology of resist and black matrix, which is applied in the field of resist composition for black matrix, and can solve the problems such as the reduction of surface resistance value

Pending Publication Date: 2021-11-02
SAKATA INX
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0010] However, in conventional resist compositions for black matrices, there is a problem that the surface resistance value decreases when high-temperature and long-term post-baking is applied, and there is still room for improvement.

Method used

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  • Resist composition for black matrix and black matrix
  • Resist composition for black matrix and black matrix
  • Resist composition for black matrix and black matrix

Examples

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Comparison scheme
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Embodiment Construction

[0151] Hereinafter, the present invention will be specifically described with reference to examples, but the present invention is not limited by these examples unless departing from the gist and scope of application of the present invention. In addition, "parts" and "%" described in this embodiment represent "parts by mass" and "% by mass", respectively, unless otherwise specified.

[0152] Various materials used in the following Examples and Comparative Examples are as follows.

[0153]

[0154] Carbon black (product name "SPECIAL BLACK 250", average primary particle size 56 nm, pH 3.0, manufactured by Orion Engineered Carbons)

[0155]

[0156] Resin 1: benzyl methacrylate / methacrylic acid block copolymer (weight average molecular weight 23000, acid value 100mgKOH / g)

[0157] Resin 2: benzyl methacrylate / methacrylic acid block copolymer (weight average molecular weight 23000, acid value 50mgKOH / g)

[0158] Resin 3: benzyl methacrylate / methacrylic acid block copolymer (...

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Abstract

Provided is a resist composition for a black matrix, from which a black matrix can be formed, the surface resistance value of which does not decrease even after a high temperature and long-term post-baking. The resist composition for a black matrix includes a black colorant, an alkali-soluble resin having a carboxyl group, a photopolymerization initiator, an organic solvent, and an oxazine compound, wherein the oxazine compound is a compound represented by general formula (1) and / or (2). In general formula (1), R1 and R2 represent an alkyl group or an aryl group optionally containing an unsaturated bond, and may be the same as or different from each other; and X1 represents any one of linking groups represented by formulae (3) to (5). In general formula (2), R3 and R4 represent an alkyl group or an aryl group optionally containing an unsaturated bond, and may be the same as or different from each other; and X2 is a divalent linking group.

Description

technical field [0001] The present invention relates to a resist composition for a black matrix and a black matrix. Background technique [0002] In the image display device using liquid crystal, plasma, etc., in the gap of the coloring pattern in the screen display area and the edge of the surrounding part of the display area, and in the external light side of the TFT in the liquid crystal display using TFT, etc., there are Shading film (black matrix, blackmatrix, otherwise known as "black matrix"). [0003] And, in the liquid crystal display device, it is mainly used to prevent the leakage from the backlight from being reflected on the screen, and in the plasma display device, it is mainly used to prevent the bleeding caused by the confusion of the various colors of light from being reflected on the screen. Helps improve display characteristics (contrast and color purity). [0004] For example, the backlight used for liquid crystal display devices is usually manufactured...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/004G02F1/1335
CPCG03F7/004G02F1/133512G03F7/0045G03F7/105G03F7/0007H10K50/865
Inventor 辻康人杉江俊辅大泊研井上拓也
Owner SAKATA INX