Charge plasma SiGe heterojunction bipolar transistor
A heterojunction bipolar and plasma technology, applied in circuits, electrical components, semiconductor devices, etc., can solve the problems of reduced breakdown voltage, increased electron concentration, unfavorable application of charge plasma bipolar transistors, etc., to achieve Increase the current gain, improve the breakdown voltage, the effect of synchronously increasing the current gain and the breakdown voltage
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0017] In the embodiment of the present invention, a charge plasma SiGe heterojunction bipolar transistor with a Ge component content of 0.1 is taken as an example to describe the content of the present invention in detail. The field to which the present invention relates is not limited thereto.
[0018] Implementation example:
[0019] The charge plasma SiGe heterojunction bipolar transistor disclosed in the embodiment of the present invention, figure 2 Illustrates its longitudinal cross-sectional schematic diagram, including Si substrate (20), thickness is 25nm; SiO 2 Buried oxide layer (21), thickness is 25nm; Undoped SiGe base region (23), Ge composition is 0.1, and thickness is 15nm, and width is 60nm; Undoped Si emitter region (22) and undoped The Si collector region (24) has a thickness of 15nm and a width of 70nm; wherein the undoped SiGe base region (23), Si emitter region (22) and Si collector region (24) are located on SiO 2 Above the buried oxide layer (21); Si...
PUM
Property | Measurement | Unit |
---|---|---|
thickness | aaaaa | aaaaa |
thickness | aaaaa | aaaaa |
width | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com