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Rapid self-cleaning process for surface of conductive sputtering target material

A sputtering target and self-cleaning technology, which is applied in metal material coating process, sputtering plating, cleaning method and utensils, etc., to save manpower and time costs, improve work efficiency, and avoid disassembly operations

Active Publication Date: 2021-12-31
ARISON SURFACE TECH SUZHOU
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In order to solve such problems, the present invention provides a rapid self-cleaning process on the surface of a conductive sputtering target

Method used

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  • Rapid self-cleaning process for surface of conductive sputtering target material

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Experimental program
Comparison scheme
Effect test

specific example 1

[0036] In the electromagnetic coil-assisted closed-field magnetron sputtering coating equipment equipped with 2 sets of Al targets and 2 sets of Cr targets, the 2 sets of Al targets form a layer of alumina contamination layer on the surface due to high temperature, and the conductivity of the alumina contamination layer is extremely poor. , causing the Al target to fail to work normally.

[0037] According to the technological operation of the present invention is as follows:

[0038] 1. Vacuum the sputter coating equipment to within 1e-4mBar at room temperature;

[0039] 2. Open all the target doors of the 4 groups of cathodes;

[0040] 3. Apply voltage to the cathodes of the two groups of Cr targets to generate cathode glow discharge, and the cathode sputtering power is 15KW;

[0041] 4. Increase the current of the electromagnetic auxiliary coil to 10A, and the generated magnetic field is enough to expand the glow discharge area of ​​the two sets of Cr target cathodes to t...

specific example 2

[0045]In the electromagnetic coil-assisted closed-field magnetron sputtering coating equipment equipped with 2 sets of Ti targets and 1 set of Cr targets, due to the mechanical failure of the Cr target cathode target door, the door was not completely closed, and the surface of the Cr target was severely covered by acetylene gas in the subsequent process. Contamination, a black mixture pollution layer is formed, and the Cr target cannot work effectively.

[0046] Selecting a routine operation requires going through the following steps:

[0047] 1. Remove the Cr target; 2. Sand blast; 3. Install it back to its original position; 4. Use glow discharge technology to sputter clean the surface to a usable state. The disassembly and installation process requires the participation of 2 operators, and the sandblasting requires 1 employee, with a total working time of about 5 hours.

[0048] According to the process operation of the present invention is as follows:

[0049] 1. Vacuum ...

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Abstract

The invention discloses a rapid self-cleaning process for the surface of a conductive sputtering target material. The rapid self-cleaning process comprises the following steps that sputtering coating equipment is vacuumized to be within 1e-4m Bar at normal temperature, all cathode target gates of the sputtering coating equipment are opened, argon is ignited by using a cathode capable of normally starting luminance, glow discharge occurs, and high sputtering power is kept; the current of an electromagnetic auxiliary coil is increased to enhance a magnetic field, and a glow discharge area extends to the position near the surface of a to-be-cleaned target material; and a cathode of the to-be-cleaned target material is started, the target material is enabled to build up luminance under a low-power condition, the sputtering power is gradually increased after the surface discharge of the target material is stable, the sputtering power is kept for a preset time length, and the self-cleaning process of the surface of the target material is completed. According to the self-cleaning process, disassembly operation is avoided, so that a large amount of manpower and time cost are saved, and the working efficiency is effectively improved.

Description

technical field [0001] The invention relates to the technical field of surface engineering, and relates to a rapid self-cleaning process for the surface of a conductive sputtering target. Background technique [0002] Targets of various materials are used in the sputtering PVD process, such as simple metal targets, non-metallic targets, alloy targets, ceramic targets, etc. In some mid-to-high-end coatings, in order to reduce the influence of pollutants on the surface of the target on the binding effect of the film base and the purity of the film layer, the surface of the target will be pre-cleaned before PVD coating to remove the impurity molecules adsorbed on the surface of the target, Target poisoning cortex and other attachments. In the case of less surface pollutants, the target can be easily self-cleaned by glow discharge during the coating process. The specific implementation method is as follows: before the formal coating, the cathode target door is kept closed and t...

Claims

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Application Information

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IPC IPC(8): B08B7/00B08B13/00C23C14/34C23C14/56
CPCB08B7/00B08B13/00C23C14/564C23C14/3407
Inventor 毛昌海祖全先帅小锋
Owner ARISON SURFACE TECH SUZHOU