7 results about "Cathode sputtering" patented technology

A plastic or metallic substrate (100) comprising at least one first layer (10) made of a metallic substance or metallic component and at least one second layer (11) made of a metallic substance or metallic compound, wherein the first layer (10) is deposited on the substrate (100) by cathode sputtering and is made of a substance having an elastic modulus of 150 Gpa or less, preferably 125 Gpa or less, and the second layer (11) is deposited on the first layer (10) by cathode sputtering and is made of a substance having a Vickers hardness of 600 or more.

The invention relates to the technical field of magnetron sputtering coating, and particularly provides magnetron sputtering coating equipment for a deep hole structure. The horizontal driving assembly is used for driving the carrier plate to move horizontally; the rotating cathode is installed in the sputtering chamber and located above the carrier plate and comprises a first magnetic pole and two second magnetic poles, the length of the first magnetic pole and the length of the second magnetic poles are both larger than the length of the edge, perpendicular to the horizontal moving direction of the carrier plate, of the carrier plate, and the first magnetic pole is downwards arranged between the two second magnetic poles; the distance between the first magnetic pole and the second magnetic pole is smaller than or equal to 3 cm, and the included angle between two sputtering tracks formed by the first magnetic pole and the second magnetic pole is smaller than 30 degrees. The particle distribution optimizer is mounted in the sputtering chamber, is positioned between the rotating cathode and the support plate, covers an effective sputtering area of the rotating cathode and is used for reducing a sputtering angle of sputtering particles sputtered by the rotating cathode; the filling capability of the deep hole structure and the film thickness uniformity of the deep hole structure can be effectively improved.

The application discloses a high-stability anode layer ion source based on auxiliary regulation, relates to the technical field of anode layer ion sources, and comprises an ion source mechanism, a bottom plate, a ring cylinder one and a ring cylinder two fixed on the bottom plate, and an insulation plate one and an insulation plate two fixed on the bottom plate. The ring cylinder two is located outside the ring cylinder one, the insulation plate one is located between the ring cylinder one and the ring cylinder two, the insulation plate two is located in the inner cavity of the ring cylinder one, and the main anode is fixed on the insulation plate one. The application prolongs the service life of the main cathode, reduces the substrate pollution, adopts the sputtering low-yield materials such as graphite and alumina ceramics for the auxiliary cathode, shields the easy-to-be-bombed area of the main cathode, shares the discharge current, reduces the etching rate of the main cathode, prolongs the service life by several times, greatly reduces the cathode sputtering material, effectively avoids the metal impurity deposition and substrate pollution, significantly improves the product yield, and reduces the maintenance cost and downtime of the cathode replacement.

The utility model provides glass coating equipment and a glass production system. The glass coating equipment comprises a cavity, a cathode, a vacuum pump, a sputtering power supply, a first cooling device and a second cooling device, the cavity is provided with a coating chamber; the cathode is accommodated in the coating chamber and is used for bearing a target material; the vacuum pump is used for extracting air in the coating chamber, so that a vacuum environment is formed in the coating chamber; the sputtering power supply is electrically connected to the cathode; the first cooling device is in heat exchange connection with the cathode so as to cool the cathode; and the second cooling device is in heat exchange connection with the sputtering power supply and the vacuum pump so as to cool the sputtering power supply and the vacuum pump. According to the glass coating equipment provided by the invention, the cooling effect on the cathode, the sputtering power supply and the vacuum pump is effectively improved, so that the reliability of the glass coating equipment is effectively improved.

The invention relates to a coating (1) for a substrate (100) made of a plastic or metallic material, comprising at least one first layer (10) made of a metallic material or a metallic compound, and at least one second layer (11) made of a metallic material or a metallic compound, the first layer (11) being deposited on the substrate (100) by means of cathodic sputtering, and the second layer (11) being deposited on the substrate (100) by means of cathodic sputtering. And wherein the first layer (11) is made of a material having an elastic modulus of less than 150 Gpa, preferably less than 125 Gpa, and the second layer (12) is deposited on the first layer (10) by means of cathode sputtering, and wherein the second layer (11) is made of a material having a hardness of greater than 600 Vickers hardness.

The invention relates to a method for depositing a stack of thin layers (14) on a face (11) of a glass substrate (10) by cathode sputtering, the stack of thin layers (14) including a silver-based metal functional layer (140, 180) deposited directly on a zinc oxide-based bottom layer (129, 169), the method including the use of an ion source, characterised in that the bottom layer (129, 169) is bombarded with ions during all or part of its deposition and has a biaxial texture: - an out-of-plane texture with an out-of-plane mosaicity of less than 15°; and - an in-plane texture with an in-plane mosaicity of less than 50°.

The invention relates to a method for manufacturing a part (15) for an aircraft propulsion assembly, the method comprising the following chronological steps: (a) providing a body (16) made of composite material comprising fibres embedded in a polymer matrix, (c) depositing a coating (17) on the body (16), characterised in that step (c) comprises the following sub-steps: (d) depositing a bonding layer (18) on the body (16) by high-power pulse magnetron cathode sputtering, and (e) depositing a functional layer (19) on the bonding layer (18) by thermal spraying.