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Photosensitive resin composition, resin cured film and image display element

A photosensitive resin and resin curing technology, which is applied in the field of photosensitive resin compositions, can solve problems such as the inability to provide a solvent-resistant resin cured film, and achieve the effect of good developability

Pending Publication Date: 2022-01-21
株式会社力森诺科
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] However, in conventional photosensitive resin compositions, there is still a problem that a cured resin film having excellent solvent resistance cannot be provided.

Method used

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  • Photosensitive resin composition, resin cured film and image display element
  • Photosensitive resin composition, resin cured film and image display element
  • Photosensitive resin composition, resin cured film and image display element

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0120] Hereinafter, although an Example and a comparative example demonstrate this invention more concretely, this invention is not limited to the following Example.

[0121] In addition, in the examples and comparative examples, the silyl group equivalent is obtained by dividing the mass average molecular weight of the (A) copolymer by the average number of silyl groups per 1 molecule of the (A) copolymer. The molecular weight of the copolymer is a calculated value calculated based on the charged amount of the compound (A-2).

[0122] The synthesis example of (A) copolymer is shown below.

Synthetic example 1

[0124] 750.0 g of 3-methoxy-1-butanol was added to a flask equipped with a stirring device, a dropping funnel, a condenser, a thermometer, and a gas introduction tube, and the mixture was stirred while replacing it with nitrogen, and the temperature was raised to 88°C.

[0125] Next, 33.3 g (0.39 moles) of methacrylic acid, 149.7 g (0.52 moles) of 3-methacryloxypropyltriethoxysilane (manufactured by Shin-Etsu Chemical Co., Ltd.) and 40.3 g (0.39 moles) of styrene mol) was added to the monomer mixture of 2,2'-azobis(isobutyrate) dimethyl (polymerization initiator) 26.8 g, and the obtained substance was dripped into the said flask from the dropping funnel over 2 hours.

[0126] After the dropwise addition, it was stirred at 88° C. for 5 hours to carry out a copolymerization reaction to obtain sample 1 (weight-average molecular weight (Mw): 4500, number-average molecular weight (Mn): 2700, molecular weight distribution (Mw / Mn): 1.7, acid value : 87KOHmg / g, silyl equivalent: 480g / ...

Synthetic example 2~17

[0127] [Synthesis Examples 2-17, Comparative Synthesis Examples 1-7]

[0128] Except having used the raw material described in Tables 1-3, it carried out copolymerization reaction similarly to the synthesis example 1, and obtained samples 2-24. The weight average molecular weight (Mw), number average molecular weight (Mn), molecular weight distribution (Mw / Mn), acid value (KOHmg / g) and silyl equivalent (g / mol) of the obtained samples are shown in Tables 1-3 . Moreover, the mol% of (A-1) compound - (A-3) compound used for preparation of (A) copolymer is shown to Tables 4-6.

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[0135]

[0136] (1) Storage stability

[0137] Using the obtained samples 1 to 24, storage stability was evaluated by the following method.

[0138] 10 g of each sample was weighed in a 20 ml glass container, and the viscosity was measured as a sample. In this specification, the viscosity refers to the value measured at 25°C using ...

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Abstract

A photosensitive resin composition which is characterized by containing: (A) a copolymer which comprises a constituent unit (a-1) derived from a polymerizable unsaturated compound having an acid group, a constituent unit (a-2) represented by formula (1) or (2), and a constituent unit (a-3) derived from another polymerizable unsaturated compound, while having a weight average molecular weight of from 1,000 to 50,000 and a molecular weight distribution (Mw / Mn) of from 1.5 to 3.0, wherein from 20% by mole to 80% by mole of the constituent unit (a-2) is contained if the total of all constituent units is taken as 100% by mole; (B) at least one solvent that is selected from the group consisting of primary alcohols having 3 to 10 carbon atoms and secondary alcohols having 3 to 10 carbon atoms; (C) a reactive diluent; and (D) a photopolymerization initiator. (In formula (1), R1 represents a hydrogen atom or a methyl group; and n represents an integer of 1 to 10. In formula (2), R2 represents a hydrogen atom or a methyl group; and m represents an integer of 1 to 10.).

Description

technical field [0001] The present invention relates to a photosensitive resin composition, a cured resin film, and an image display element. Background technique [0002] In recent years, with the popularization of liquid crystal displays, color filters used as components of liquid crystal displays, overcoat layers provided on color filters, interlayer insulating films, and the like have been actively studied. [0003] For example, an overcoat layer and an interlayer insulating film require high surface hardness in terms of their properties, and also require alkali developability when produced by a photolithography process. As a material having such properties, Patent Document 1 proposes a photosensitive resin composition comprising a resin (A), a silane coupling agent (B), a polymerizable compound (C), a photopolymerization initiator (D ) and solvent (E). [0004] Usually, a liquid crystal display is manufactured by interposing liquid crystal between the color filter boa...

Claims

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Application Information

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IPC IPC(8): G03F7/027G03F7/004G03F7/033
CPCG03F7/027G03F7/004G03F7/033G03F7/0758G03F7/0045G03F7/028G03F7/105C08F230/08
Inventor 仓本拓树周正伟川口恭章木下健宏
Owner 株式会社力森诺科