Parallel direct writing device based on ten-thousand-beam independent controllable laser dot matrix generation

Abstract

The invention discloses a parallel direct writing device based on ten-thousand-beam independent controllable laser dot matrix generation. The device mainly comprises four identical light paths; each light path comprises a core element digital micromirror array DMD and a core element micro-lens array MLA and is used for generating thousand-beam independent controllable inscribing dot matrixes; the DMD in each light paths equally divides an effective pixel area into M * N sub-arrays; one sub-array corresponds to one sub-light spot; the M * N sub-light spots emitted from the DMD coincide with the M * N micro-lens of the MLA in space to generate an M * N thousand-beam focus array, and the M * N thousand-beam focus array is finally imaged on the focal plane of the objective lens; the generation of the ten-thousand-beam inscribing dot matrix is finally realized through the splicing of the four thousand-beam dot matrixes; the high-quality complex three-dimensional microstructure can be quickly processed; and the method can be applied to the fields of super-resolution photoetching and the like.

Description

technical field [0001] The invention belongs to the field of micro-nano processing, and more specifically relates to a parallel direct writing device and method based on the generation and independent control of tens of thousands of laser dot arrays. Background technique [0002] Two-photon laser direct writing technology has always been a research hotspot in three-dimensional micro-nano processing technology due to its high resolution, true three-dimensional processing capability, low thermal influence, and wide range of processing materials. With the development of laser direct writing technology towards industrial applications, how to realize high-precision and simultaneous high-speed, complex and large-area writing is a key problem that needs to be urgently solved in today's laser direct writing technology. [0003] In order to effectively improve the efficiency of laser direct writing, researchers try to improve the optical processing method, that is, use multiple beams...

AI Technical Summary

Problems solved by technology

Although the parallel lithography technology based on SLM or DMD can independently control each beam through dynamic coding, the number of beam arrays realized is small, and it is still a short board that limits the processing speed when processing complex structures, especially the refresh rate of SLM is slow. Further limits the increase in writing speed

The literature [Advanced Functional Materials, 2020, 30, 1907795] uses the diffraction optical element DOE to generate a 3×3 femtosecond laser writing array. Although the diffraction optical element has the potential to generate array points, the number of arrays realized is small, and each focal point cannot be independent control

The parallel processing method based on the microlens array [Laser & Photonics Reviews, 2020, 14] and the interference lattice [Applied Sciences, 2021, 11(14):6559] can realize large-area fast laser direct writing, but the spot cannot be independently Control, consistency of lattice intensity and sub-spot quality are difficult to guarantee, so only a single repetitive structure can be processed, and the uniformity error of the processed periodic structure is relatively large, and the processing accuracy is on the order of microns

[0004] To sum up, at present, hundreds or even thousands of beams of laser lattices are difficult to achieve independent control, and the intensity consistency of the lattice and the quality of sub-spots deteriorate sharply with the increase in the number of sub-spots of the lattice, making it difficult to meet the high-throughput processing requirements of complex and large-area three-dimensional structures

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