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Flexible stretchable gold film electrode based on reactive ion etching and preparation method thereof

A reactive ion etching, flexible technology, applied in the direction of ion implantation plating, metal material coating process, coating, etc., can solve unfavorable wearable biological signal monitoring, flexible electrode stability is not high, stretchability Insufficient and high problems, to achieve the effect of excellent stretchability, excellent interfacial adhesion, and few steps

Pending Publication Date: 2022-03-01
SHENZHEN INST OF ADVANCED TECH CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] The existing flexible electrodes have the following disadvantages: the substrate of the existing conductive film flexible electrodes is composed of PDMS or other elastic polymers, the stretchability is not high enough, and the interface adhesion between the conductive film and the polymer substrate is relatively poor , easy to fall off, resulting in low stability of flexible electrodes, which is not conducive to long-term implanted nerve electrodes or long-term body surface wearable biosignal monitoring

Method used

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  • Flexible stretchable gold film electrode based on reactive ion etching and preparation method thereof
  • Flexible stretchable gold film electrode based on reactive ion etching and preparation method thereof
  • Flexible stretchable gold film electrode based on reactive ion etching and preparation method thereof

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preparation example Construction

[0030] A method for preparing a highly stretchable flexible gold film electrode comprises the following steps: magnetron sputtering a layer of gold film 3 on the surface of a polymer flexible substrate treated by a reactive ion etching process. The thickness of the gold thin film 3 is 10-40 nanometers, and the gold thin film 3 has a micron and / or nanoscale crack structure.

[0031] In this application, the reactive ion etching method is used to process the surface of the polymer substrate to change its surface properties and microscopic morphology, thereby affecting the performance of the gold film 3 deposited by magnetron sputtering. The gold film 3 deposited on it has microns and Nanoscale crack structure. Since the gold film 3 produces micro- and nano-scale crack structures during the magnetron sputtering deposition process, when the gold film 3 is subjected to tensile stress, the micro-cracks can undergo surface deformation, so that a large external force stretches only on...

Embodiment 1

[0044] Embodiment 1: refer to figure 1 , the embodiment of the present application provides a method for preparing a highly stretchable flexible gold film electrode, comprising the following steps:

[0045] Step 1: Dissolving SEBS particles in dimethylformamide solvent to prepare a 15% concentration solution, spin-coating on a three-inch silicon wafer 1, and standing for 10 hours until SEBS volatilizes to form a film to obtain SEBS polymer substrate 2;

[0046] Step 2: Put the SEBS polymer substrate 2 in the reactive ion etching equipment, adjust the parameters of Ar gas 10ccm, CF4 gas 30ccm, 13.3Pa, 150W, etch for 90 seconds;

[0047] Step 3: Paste the patterned metal mask on the surface of the SEBS polymer flexible substrate in step 2, and absorb it with a magnet to make it tightly attached;

[0048] Step 4: Magnetron sputtering a layer of gold film 3 on the surface of the SEBS polymer flexible substrate, the thickness of the gold film 3 is 20 nanometers, the process is a s...

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Abstract

The invention discloses a flexible stretchable gold film electrode based on reactive ion etching and a preparation method thereof, and relates to the technical field of electrode materials. The preparation method comprises the following steps: carrying out magnetron sputtering on the surface of a high-molecular flexible substrate treated by a reactive ion etching process to form a layer of gold film; wherein the thickness of the gold thin film is 10-40 nanometers, and the gold thin film is provided with a crack structure with a micron scale and / or a nano scale. The method is used for improving the tensile property of the flexible gold film electrode.

Description

technical field [0001] The present application relates to the technical field of electrode materials, in particular to a flexible and stretchable gold film electrode based on reactive ion etching and a preparation method thereof. Background technique [0002] Traditional semiconductor devices are planar rigid materials based on silicon. Due to the brittleness of silicon, the fracture strain is less than 1%, so traditional electronic devices do not have flexibility and stretchability at all. Electronic devices that are soft and stretchable like rubber will gradually replace traditional rigid electronic devices. Future electronic devices will be highly deformable, capable of changing their shape to meet deformation requirements such as stretching, compression, and wrinkling. Flexible and stretchable electronic devices will make many applications possible, especially in the fields of biomedical devices, flexible displays, and smart wearable devices. Some specific application e...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/35C23C14/02C23C14/04C23C14/20
CPCC23C14/35C23C14/022C23C14/042C23C14/205
Inventor 刘志远李光林赵阳余潜衡远
Owner SHENZHEN INST OF ADVANCED TECH CHINESE ACAD OF SCI
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