Etchant composition for display panel and etching method of display panel
A display panel and composition technology, applied in the direction of surface etching composition, chemical instrument and method, electric solid device, etc., can solve the problems of high process cost, increased process time and complexity, expensive photomask, etc., to achieve The effect of reducing process time, optimizing process, and reducing process cost
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Embodiment 1-12
[0054] In the following examples, the basic solution is composed of the following raw materials in weight percentage: 10% hydrogen peroxide, 0.2% hydroxybenzotriazole (etching inhibitor), 4% citric acid and 1% malonic acid (etching additive ), 0.2% sulfuric acid (pH regulator), and according to the following table 1, different contents of fluoride and water in different amounts were added to the above-mentioned basic solution to prepare the etching solution compositions of Examples 1-12 of the present disclosure.
[0055] Table 1
[0056]
[0057] Next, using the etching solution compositions shown in the foregoing Examples 1-12 at a temperature of 32° C. to etch the test object including the copper-molybdenum laminated electrode layer and the silicon-containing non-metallic layer for 130 seconds, observe the Table 2 shows the etching results of the electrode layer including the copper-molybdenum stack and the silicon-containing metal layer.
[0058] Table 2
[0059]
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