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Mask for splicing and aligning nanoimprint metal grating and metal grating splicing method

A technology of metal grating and nanoimprinting, which is applied in the direction of optics, optomechanical equipment, and photoplate-making process of pattern surface, etc., can solve the problem of high cost, achieve the effect of ensuring service life, avoiding cracking and falling off

Active Publication Date: 2022-03-18
NANJING UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At present, the alignment for nanoimprinting mainly focuses on the research on the device, which is costly

Method used

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  • Mask for splicing and aligning nanoimprint metal grating and metal grating splicing method
  • Mask for splicing and aligning nanoimprint metal grating and metal grating splicing method
  • Mask for splicing and aligning nanoimprint metal grating and metal grating splicing method

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Embodiment 1

[0108] Step 1: First, treat the cleaned Si substrate with oxygen plasma (IonWave 10 plasma cleaning machine) for 4 minutes, and then put it into the HMDS pretreatment oven for 10 minutes to enhance the adhesion between the photoresist and the substrate. After the silicon wafer is cooled, it starts to spread the glue. The photoresist is AZ5214, and the glue spread rate is 4000rpm. At this time, the thickness of the glue obtained is 1.5μm. mask, the reference mask as Figure 9 as shown, Figure 9 In the figure, the unit of the number is μm; use a lithography machine (SUSS MA6BA6) to expose for 1.2s, and the light intensity of the lithography machine is 55mw / cm 2 , After the exposure is completed, put it in 2.38% TMAH developer solution for development for 35s, then immediately put it into deionized water and rinse it with plenty of water, blow it dry with nitrogen, and then use oxygen plasma to remove the residual glue.

[0109] Step 2. After the photolithography process is co...

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Abstract

The invention belongs to the technical field of micro-nano processing, and provides a mask for splicing and aligning nanoimprint metal gratings and a metal grating splicing method. The mask provided by the invention comprises a reference mask and an alignment mask, the reference mask is provided with a plurality of reference marks; the reference mark comprises a square reference point and a first vernier; the square reference point is provided with a cross-shaped slit; at least one alignment mark is arranged on the alignment mask; the alignment mark comprises a cross-shaped alignment point and a second vernier. The alignment mark in the alignment mask is aligned with the reference mark in the reference mask, so that the splicing error of the metal grating can be reduced, and the alignment precision is improved.

Description

technical field [0001] The invention relates to the technical field of micro-nano processing, in particular to a mask for splicing and aligning nanoimprinted metal gratings and a metal grating splicing method. Background technique [0002] With the development of nanotechnology, nanoscience gradually extends to various fields. A variety of micro-nanostructure preparation methods are emerging in an endless stream. However, to obtain large-area ordered nanostructures can only be achieved with the help of top-down micro-nanofabrication technology. As a new processing technology invented in 1995, nanoimprint technology has broken through the limit of optical diffraction and can prepare smaller-scale structures; and compared with technologies such as electron beam lithography, it can achieve order without expensive equipment. Preparation of structures. The principle of nanoimprinting is to press a mold with a nanoscale convex-concave structure onto a deformable material, and t...

Claims

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Application Information

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IPC IPC(8): G03F9/00G03F7/00
CPCG03F9/7023G03F9/708G03F7/0002
Inventor 简旸葛海雄
Owner NANJING UNIV