Preparation method of novel multifunctional light-emitting triode device
A light-emitting triode, multi-functional technology, applied in the direction of semiconductor devices, electrical components, circuits, etc., can solve the problems of difficult to ensure accuracy, photolithography process is difficult to ensure accuracy, etc., to achieve the effect of simple process
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[0030] In order to make the features and advantages of this patent more obvious and easy to understand, the following special examples are described in detail as follows:
[0031] Such as Figure 1-Figure 8 As shown, this embodiment provides a preparation method for preparing a novel multifunctional light-emitting triode device, including the following process steps;
[0032] Step S1: providing a semiconductor substrate, depositing the first N-type semiconductor layer 1 on the substrate;
[0033] Step S2: making a mask layer 2 by photolithography, exposing a predetermined area on the first N-type semiconductor 1 to the outside of the mask layer 2;
[0034] Step S3: making a dielectric layer 3 on the first N-type semiconductor layer 1 and the mask layer 2;
[0035] Step S4: remove the mask layer, and prepare the first P-type semiconductor layer 4 on the first N-type semiconductor layer 1;
[0036] Step S5: remove the dielectric layer formed in step S3 by wet etching, prepare...
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