Improved wet etching method for selectively removing silicon nitride
A technology of wet etching and silicon nitride, which is applied in the manufacture of electrical components, circuits, semiconductors/solid-state devices, etc., can solve the problems of reducing etching performance and wafer cross-contamination, achieve high selectivity, improve quality, and avoid impurities cumulative effect
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[0032] The present invention will be described in detail below with reference to the accompanying drawings and specific embodiments. The present invention is not limited to this embodiment, and other embodiments may belong to the scope of the present invention as long as it conforms to the gist of the present invention.
[0033] In a preferred embodiment of the present invention, based on the above problems existing in the prior art, an improved wet etching method for selectively removing silicon nitride is provided, such as figure 1 shown, including:
[0034] In step S1, a wafer is provided, and a silicon nitride layer and a silicon oxide layer are grown on the upper surface of the wafer;
[0035] Step S2, providing a phosphoric acid mixed solution, and heating the phosphoric acid mixed solution to a preset temperature;
[0036] In step S3, the phosphoric acid mixed solution is sprayed on the upper surface of the wafer, and the upper surface of the wafer is wet-etched to re...
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