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High-frequency LLC power supply and control method thereof

A power supply and high-frequency technology, applied in the field of switching power supply, can solve the problems that cannot meet the requirements of plasma spraying, reduce the dynamic characteristics of the arc, etc., and achieve the effect of reducing the amplitude and improving the efficiency of the whole machine

Pending Publication Date: 2022-05-31
HEBEI UNIVERSITY OF SCIENCE AND TECHNOLOGY +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The way for conventional power supplies to reduce ripple is to increase the output filter inductance, but a larger filter inductance will reduce the dynamic characteristics of the arc, which cannot meet the needs of plasma spraying.

Method used

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  • High-frequency LLC power supply and control method thereof
  • High-frequency LLC power supply and control method thereof
  • High-frequency LLC power supply and control method thereof

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Embodiment Construction

[0028] In the following description, specific details such as specific system structures and technologies are presented for the purpose of illustration rather than limitation, so as to thoroughly understand the embodiments of the present application. It will be apparent, however, to one skilled in the art that the present application may be practiced in other embodiments without these specific details. In other instances, detailed descriptions of well-known systems, devices, circuits, and methods are omitted so as not to obscure the description of the present application with unnecessary detail.

[0029] It should be understood that when used in this specification and the appended claims, the term "comprising" indicates the presence of described features, integers, steps, operations, elements and / or components, but does not exclude one or more other Presence or addition of features, wholes, steps, operations, elements, components and / or collections thereof.

[0030] It should...

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Abstract

The invention is applicable to the technical field of switching power supplies, and provides a high-frequency LLC power supply and a control method thereof, and the high-frequency LLC power supply comprises a switching network which comprises a three-phase full-bridge switch formed by connecting a first switching group to a third switching group in parallel; the resonance network comprises first to third resonance circuits which are respectively connected with the first to third switch groups in a one-to-one correspondence manner; the high-frequency transformer unit comprises a first high-frequency transformer, a second high-frequency transformer and a third high-frequency transformer, and the high-frequency transformers are connected with the first resonance circuit, the second resonance circuit and the third resonance circuit in a one-to-one correspondence mode; and the rectifier bridge unit comprises a first rectifier bridge to a third rectifier bridge which are connected in parallel, and the first rectifier bridge to the third rectifier bridge are respectively connected with the corresponding secondary coils of the first high-frequency transformer to the third high-frequency transformer. According to the high-frequency LLC power supply and the control method thereof provided by the invention, compared with a conventional power supply, a direct current output side does not need a filter inductor, the output ripple frequency is improved to 12 times of the switching frequency, and the amplitude of the ripple is greatly reduced.

Description

technical field [0001] The application belongs to the technical field of switching power supplies, and in particular relates to a high-frequency LLC power supply and a control method thereof. Background technique [0002] Plasma spraying is a technique for surface strengthening and surface modification of materials using a plasma arc. The plasma arc is a compression arc. Compared with the free arc, the arc column is thinner, the current density is higher, and the gas ionization degree is higher. Therefore, it has the characteristics of high temperature, concentrated energy, and good arc stability. Plasma spraying can make the surface of the substrate have properties such as wear resistance, corrosion resistance, high temperature oxidation resistance, electrical insulation, heat insulation, radiation protection, wear reduction and sealing. [0003] Plasma spraying arc is very sensitive to power supply ripple, and ultra-low current ripple is very important for precision spray...

Claims

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Application Information

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IPC IPC(8): H02M3/335H02M1/15
CPCH02M3/3353H02M1/15Y02B70/10
Inventor 汪殿龙吴朝峰彭珍珍程旭峰何箐王锦江
Owner HEBEI UNIVERSITY OF SCIENCE AND TECHNOLOGY
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