Method for detecting content of cyclic amine compound in copper etching liquid

Abstract

The invention provides a method for detecting the content of cyclic amine compounds in a copper etching solution. The method comprises the following steps: preparing standard solutions of cyclic amine compounds with different concentrations; the method comprises the following steps: testing absorption peaks of cyclic amine compound standard solutions with different concentrations by adopting an ultraviolet and visible spectrophotometer, integrating the absorption peaks to obtain corresponding integral areas, and drawing a concentration-integral area linear formula; the method comprises the following steps: under the same detection conditions of a to-be-detected copper etching solution and a cyclic amine compound standard solution, testing an absorption peak of a to-be-detected sample by adopting an ultraviolet spectrophotometer, carrying out integration on the absorption peak, substituting into a linear formula, and calculating to obtain the concentration of the cyclic amine compound. The detection method provided by the invention is high in precision, easy to operate and small in waste liquid amount, and can realize rapid detection of cyclic amine compounds, especially pyridine compounds, in the copper etching liquid. The method is especially suitable for rapid and sensitive detection of pyridine compounds in the copper etching liquid prepared by the method.

Description

A kind of detection method of cyclic amine compound content in copper etching solution technical field The present invention relates to etching solution field, relate to the detection method of cyclic amine compound content in a kind of copper etching solution. Background technique [0002] Liquid crystal display panels can be seen everywhere in life and are indispensable, such as mobile phones, televisions, computers, automobiles, billboards, And in the field of military industry, liquid crystal displays must be used, which has become a necessary medium for people to receive information. on the LCD panel In the process, etching solution is a necessary raw material. Currently widely used types of etching solutions are: alkaline copper chloride etching solution, acid chloride etching solution Copper etchant, ferric chloride etchant, ammonium persulfate etchant, chromic acid etchant, sulfuric acid etchant, hydrogen peroxide etchant Wait. At present, hydrogen peroxide ...

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Problems solved by technology

However, the etching solution is a solution system with complex components, and ordinary detection methods cannot achieve the accuracy of this type of situation where multiple background substances affect the detection of the target.

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