Pretreatment device for boronizing internal chamber of fusion device and application of pretreatment device
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- ENN SCI & TECH DEV
- Publication Date
- 2022-06-21
Smart Images

Figure 1
Abstract
Description
technical field
[0001] The invention relates to the boronation technology of fusion devices, in particular to a pretreatment device for boronation of internal chambers of fusion devices. Background technique
[0002] The suppression of plasma impurity ions in the fusion device chamber is one of the major problems that must be solved to achieve controlled thermonuclear fusion. In the physical experiment of the tokamak nuclear fusion device, the high-temperature plasma collides with the inner wall of the device chamber, so that the chamber wall releases various impurities into the plasma in the device chamber, and the impurities will lose the energy of the plasma, thus causing the plasma Huge loss of body energy. Growing a boron film layer on the inner wall of the nuclear fusion vacuum chamber can effectively inhibit the escape of metal impurities, oxygen and carbon impurities in the inner wall, and effectively prevent the inner wall material from being collided as impurities...