Composite film, coated glass as well as preparation method and application of coated glass
A technology of coated glass and composite film, applied in coating and other directions, can solve the problems of poor processability of coated glass, easy oxidation of film surface, complex structure of film surface, etc., to achieve uniform surface heat absorption, improve surface uniformity, and reduce bubbles effect of probability
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Embodiment 1
[0104] This embodiment discloses a coated glass, the schematic diagram of which is as follows: figure 1 As shown in the figure, it includes a glass body and a coating (composite film) provided on the surface of the glass body. The coating sequentially includes an inner dielectric layer, an inner silver layer, an inner silver protective layer, an intermediate dielectric layer, and an intermediate silver layer from the outside of the glass body. , an intermediate silver protective layer, an outer dielectric layer, an outer silver layer, and an outer silver protective layer, the outer silver protective layer sequentially includes: Ni layer, AZO layer III, SiN layer from the outside of the glass body. X Layer II, ZrO X Floor. The inner dielectric layer sequentially includes SiN from the glass body to the outside X Layer I, ZnAlO X Layer I. The intermediate dielectric layer sequentially includes SiO from the glass body to the outside X layer, ZnSnO X Layer I, ZnAlO X Layer I...
Embodiment 2
[0128] This embodiment discloses a coated glass. The only difference from Embodiment 1 is that in the preparation process of the coated glass in this embodiment, when the zirconia target is working, the power of 35Kw is used to adjust the proportion of oxygen added to verify the The stability of the working current and working voltage of the zirconia target under different atmospheres, where the argon content is fixed at 1500sccm, and the test results are as follows Figure 3-4 shown, where image 3 , the abscissa is the oxygen content, and the ordinate is the voltage; Figure 4 , the abscissa is the oxygen content, and the ordinate is the current.
[0129] It can be seen from the voltage change curve that when the argon content is fixed at 1500sccm, the voltage gradually decreases with the increase of the oxygen content. When the oxygen content is 30-45sccm, the voltage is relatively stable. It can be seen from the change curve of the current that when the argon content is fi...
Embodiment 3
[0131] Based on the exploration results of the oxygen content in Example 2, according to the changes in current and voltage, and the consumption rate of the target material considered, in this embodiment, the sputtering process of zirconia when the oxygen is 30-45 sccm is selected, specifically:
[0132] This embodiment discloses a coated glass, and the difference from Embodiment 1 is that in the preparation process of the coated glass of this embodiment, SiN X Layer II and ZrO X The process of layer sputtering is different:
[0133] Sputtering SiN X The process of layer II and the sputtering of SiN in Example 1 X The difference in the process of layer II is: the sputtered SiN in this example X Layer II uses a rotating silicon target;
[0134] Sputtering ZrO X Layer process and sputtered ZrO in Example 1 X The difference in the process of the layer is: the sputtered ZrO in this example X The atmosphere of the layers was: Argon and Oxygen were deposited in an atmosphere ...
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Abstract
Description
Claims
Application Information
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