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Anatase titanium dioxide film and preparation method thereof

A titanium dioxide and anatase technology, applied in the field of materials, can solve the problems of single type of exposed in-situ growth crystal plane and limited types of growth substrates, and achieve the effect of expanding applicable scenarios

Active Publication Date: 2022-08-05
SUN YAT SEN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0003] In order to overcome the problems in the prior art that the types of growth substrates are limited and the types of exposed in-situ growth crystal planes are single, one of the objectives of the present invention is to provide an anatase titanium dioxide film, and the second objective of the present invention is to provide this sharp Preparation method of titanium dioxide thin film of titanium ore

Method used

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  • Anatase titanium dioxide film and preparation method thereof
  • Anatase titanium dioxide film and preparation method thereof
  • Anatase titanium dioxide film and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0042] Anatase TiO of this example 2 The film preparation method is as follows:

[0043] (1) Treatment of the substrate

[0044] The FTO conductive glass was placed in a mixed solution of acetone: anhydrous ethanol: ultrapure water = 1: 1: 1 for ultrasonic cleaning for 1 hour. During the ultrasonic cleaning process, pay attention to maintaining the temperature of the ultrasonic solution to prevent the surface of the substrate from changing due to ultrasonic vibration and heating. . After ultrasonication, the substrates were placed in anhydrous ethanol and ultrapure water for 15min respectively, and then rinsed with ultrapure water to remove residual acetone and anhydrous ethanol on the surface of the substrate. Finally, the cleaned FTO conductive glass was placed in a container. Have a beaker of ultrapure water ready for use.

[0045] (2) Experimental process

[0046] Take 12.5mL of analytically pure (AR) hydrochloric acid and pour it into a beaker containing 37.5mL of ult...

Embodiment 2

[0049] Anatase TiO of this example 2 The film preparation method is as follows:

[0050] (1) Treatment of the substrate

[0051] The FTO conductive glass was placed in a mixed solution of acetone: anhydrous ethanol: ultrapure water = 1: 1: 1 for ultrasonic cleaning for 1 hour. During the ultrasonic cleaning process, pay attention to maintaining the temperature of the ultrasonic solution to prevent the surface of the substrate from changing due to ultrasonic vibration and heating. . After ultrasonication, the substrates were placed in anhydrous ethanol and ultrapure water for 15min respectively, and then rinsed with ultrapure water to remove residual acetone and anhydrous ethanol on the surface of the substrate. Finally, the cleaned FTO conductive glass was placed in a container. Have a beaker of ultrapure water ready for use.

[0052] (2) Experimental process

[0053] Take 30mL of analytically pure (AR) hydrochloric acid and pour it into a beaker containing 30mL of ultrapu...

Embodiment 3

[0056] Anatase TiO of this example 2 The film preparation method is as follows:

[0057] (1) Treatment of the substrate

[0058] The FTO conductive glass was placed in a mixed solution of acetone: anhydrous ethanol: ultrapure water = 1: 1: 1 for ultrasonic cleaning for 1 hour. During the ultrasonic cleaning process, pay attention to maintaining the temperature of the ultrasonic solution to prevent the surface of the substrate from changing due to ultrasonic vibration and heating. . After ultrasonication, the substrates were placed in anhydrous ethanol and ultrapure water for 15min respectively, and then rinsed with ultrapure water to remove residual acetone and anhydrous ethanol on the surface of the substrate. Finally, the cleaned FTO conductive glass was placed in a container. Have a beaker of ultrapure water ready for use.

[0059] (2) Experimental process

[0060] Take 15mL of analytical pure (AR) hydrochloric acid and pour it into a beaker containing 45mL of ultrapure...

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Abstract

The invention discloses an anatase titanium dioxide film and a preparation method thereof. A preparation method of an anatase titanium dioxide film comprises the following steps: (1) adding sodium fluoride into a hydrochloric acid solution, stirring for the first time, adding a titanium source, and stirring for the second time to obtain a mixture; and (2) placing the mixture obtained in the step (1) and a substrate in a reaction device for crystallization treatment, and after crystallization treatment, obtaining the anatase titanium dioxide film on the surface of the substrate. Sodium fluoride and hydrochloric acid are adopted as a fluorine source and an acid source, the growth environment of high H < + > and low F <-> or low H < + > and high F <-> is achieved, sodium fluoride is in a complete ionization state in the solution, F <-> ions belong to small-size ions and move fast in the solution, and needed F <-> ions can be provided through'quantitative tailoring 'according to the requirement of titanium; the fluorine source is not influenced by the change of the growth environment.

Description

technical field [0001] The invention belongs to the field of materials, in particular to an anatase titanium dioxide thin film and a preparation method thereof. Background technique [0002] TiO with specific crystal planes exposed 2 Thin films play important roles in photochemical catalysis, electrochemical sensing, and self-cleaning surfaces. At this stage, TiO with exposed specific crystal planes is mainly prepared by the following two processes 2 Thin film: ① First prepare TiO that exposes a specific crystal plane 2 The powder is then post-processed to form a film (powder film formation); ②In-situ growth of TiO that exposes a specific crystal plane on the base material 2 Thin films (in situ film formation). The first powder film-forming technique was to incorporate TiO 2 Nanoparticles (adding binders such as terpineol, ethyl cellulose, etc.) are coated (wiped) (drop coating, spin coating, film slinging, film pulling) on ​​the substrate, and are obtained after drying...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C03C17/34
CPCC03C17/3417Y02P70/50
Inventor 于耀光王长磊路永亮李钰
Owner SUN YAT SEN UNIV