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Flexible light patterning mask for high resolution organic light emitting display and method of manufacture

A light patterning and patterning technology, applied in semiconductor/solid-state device manufacturing, final product manufacturing, sustainable manufacturing/processing, etc., can solve problems such as poor image quality, inability to achieve high resolution, and obstacles to the smooth supply of organic light-emitting materials , to achieve the effect of high resolution

Pending Publication Date: 2022-08-05
HUNET PLUS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

During the deposition of the organic light-emitting material using a metal mask, this blocking prevents the smooth supply of the organic light-emitting material to some areas below the opening, resulting in uneven deposition of the organic light-emitting material on the substrate
In organic light-emitting displays, in the absence of uniform deposition of organic light-emitting materials, high-precision pixel patterns cannot be formed, resulting in poor image quality and ultimately high resolution cannot be achieved

Method used

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  • Flexible light patterning mask for high resolution organic light emitting display and method of manufacture
  • Flexible light patterning mask for high resolution organic light emitting display and method of manufacture
  • Flexible light patterning mask for high resolution organic light emitting display and method of manufacture

Examples

Experimental program
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Effect test

example 1

[0086] 7.5g (g) resin (Takoma, TSR-SB5K), 0.7g photoinitiator (Takoma, TPM-P370), 2.1g photocurable material (DPHA), 0.05g adhesion aid (KBM403), 0.1g surface The active agent (FZ2122) was mixed with 10.5 g of solvent (PGMEA) to prepare a negative working photoresist composition. The photoresist composition was spin-coated on a glass substrate to form a 12 μm thick photoresist film. Then, a photomask having a pattern (1 to 50 μm in size) is placed on the photoresist film. The photoresist film was exposed to an ultra-high pressure mercury lamp, and a 0.04% potassium hydroxide solution was used as a developer for spray development at 23° C. for 60 seconds. Next, the developed photoresist film was hard-baked at 250° C. for 60 minutes to produce a flexible photo-patterned mask including a patterned layer (10 μm thick) with a plurality of tapered openings (taper angle 40°) .

example 2

[0088] 7.5 g of resin (Takoma, TSR-SB10K), 3 g of photoactive material (diazonaphthoquinone compound), 5 g of solvent (PGMEA), 0.15 g of adhesion aid (KBM403), and 0.2 g of surfactant (FZ2122) were mixed to A positive photoresist composition is prepared. The photoresist composition was spin-coated on a glass substrate and prebaked thereon to form a 12 μm thick photoresist film. Then, a photomask having a pattern (1 to 50 μm in size) is placed on the photoresist film. The photoresist film was exposed to an ultra-high pressure mercury lamp, and 2.38% TMAH (tetramethylammonium hydroxide) was used as a developer for spray development at 23° C. for 60 seconds. Next, the developed photoresist film was hard-baked at 250° C. for 60 minutes to produce a flexible photo-patterned mask including a patterned layer (10 μm in thickness) with a plurality of tapered openings (taper angle 50°) .

example 3

[0090] Each of the flexible photopatterned masks fabricated in Example 1 and Example 2 was aligned on the glass substrate with the smallest width of the opening (O) of the patterned layer facing the substrate. Then, the organic light-emitting material is vacuum deposited on the glass substrate through the openings of the patterned layer.

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Abstract

The invention relates to a method for manufacturing a flexible light patterning mask. The method includes a) applying a photoresist composition on a substrate to form a photoresist film, b) exposing the photoresist film to pattern the photoresist film, c) developing the patterned photoresist film, and d) curing the developed photoresist film to form a patterned layer having a plurality of tapered openings.

Description

technical field [0001] The present invention relates to a flexible light pattern mask for manufacturing an organic light emitting display with high resolution and a method for manufacturing the light pattern mask. Background technique [0002] Significant progress has been made in the field of flat panel displays. Flat panel displays, especially the leading liquid crystal displays (LCDs), have begun to appear on the market and surpass cathode ray tubes (CRTs). In recent years, display devices such as Plasma Display Panels (PDPs), Visual Fluorescent Displays (VFDs), Field Emission Displays (FEDs), Light Emitting Diodes (LEDs) and Electroluminescence (EL) devices have undergone intense competition, which Visibility, color performance and manufacturing have been improved. [0003] Organic Light Emitting Displays (OLEDs) have attracted attention as flat panel displays due to their small footprint. Other advantages are that OLEDs are very thin, can be addressed in a matrix, an...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L51/56H01L51/00G03F7/12C23C16/04
CPCG03F7/12G03F7/0035G03F7/038G03F7/023C23C14/042H10K71/166H10K71/40C23C16/042H10K71/00G03F1/38G03F1/76
Inventor 车爀镇柳美善
Owner HUNET PLUS