Process detection system for plasma process

Abstract

Plasma process control arrangement controls a plasma generator (12) that provides electrical power to a plasma chamber (18) for an RF or DC plasma process. A sensor system (16) detects operating parameters of the electrical power, including voltage and current levels. A process detection system (PDS) controller (26) has inputs coupled to the sensor system (16) to receive the operating parameters, a programmable memory unit (30) for storing a control program to computer an output control signal based on said operating parameters, and a control output coupled to a control input of the plasma generator. An external computer device (42), includes a monitor (46), an icon copying device, e.g., a mouse (50) suitable for drag-and-drop operation, and a memory storing a suitable code-building pro-gram (44) for generating a user-selected control program according to user-determined process requirements. Respective graphical icons and presented on the monitor and are selected and connected by use of the icon copying device to represent logic processing of the operational parameters, and the external computer device (42) creates the corresponding user-selected control program. The user-selected control program is downloaded from the external computer device to the programmable memory (30) of the PDS controller (26), e.g., using standard connectors and cables.

Description

technical field [0001] The present invention relates to plasma generating apparatus, and more particularly to plasma control means, such as stopping a plasma plating or etching process at a suitable endpoint. The present invention also relates to controlling the plasma process based on detected operating parameters, such as current and voltage in DC plasma operation, or applied radio frequency (RF) power current, voltage and phase in radio frequency plasma operation. The invention also relates to a system for modifying control algorithms according to user-defined requirements. Background technique [0002] In a typical RF power installation, a high power RF source generates RF waves at a predetermined frequency, ie, 13.56 MHz, and supplies them to the plasma chamber through a power conduit. Since there is usually a severe impedance mismatch between the RF power supply and the plasma chamber, an impedance matching network is placed between the two. There are non-linearities...

AI Technical Summary

Problems solved by technology

The detection system of Turner et al. is also complex, cumbersome and expensive

Also, there is no means of storing user-defined algorithms

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