Method for preparing titanium dioxide film under room temperature
A technology of titanium dioxide and thin film, which is applied in the field of preparing titanium dioxide thin film, achieves the effect of good repeatability, simple and easy method, and widening the selection range
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Embodiment 1
[0029] After cleaning the conductive glass substrate, dry it with nitrogen gas, place it on the sample holder of the sputtering instrument, use pure titanium as the target material, and take it out after sputtering for 230 seconds. At this time, a layer of metal titanium is coated on the conductive substrate. membrane. Using 1M nitric acid solution as the electrolyte solution, the voltage is 15V, and the current is controlled at 0.1mA-1A to electrolyze the film to obtain anatase TiO with nano-scale microporous structure. 2 film, it can be seen that the porous film is made of TiO 2 Composed of nano-scale particles, the size of the micropores is about 50-200nm and the appearance is as attached figure 1 . This film has photoelectric response, as attached figure 2 . The nanoscale microporous TiO 2 Thin films can be efficiently combined with dyes to form dye-sensitized TiO 2 Thin film electrode, its photoelectric response spectrum as attached image 3 .
Embodiment 2
[0031] After cleaning the conductive glass substrate, dry it with nitrogen gas, place it on the sample holder of the sputtering instrument, use pure titanium as the target material, and take it out after sputtering for 230 seconds. At this time, a layer of metal titanium is coated on the conductive substrate. membrane. Using 1M sulfuric acid solution as the electrolyte solution, the voltage is 15V, and the current is controlled at 0.1mA-1A to electrolyze the film to obtain anatase TiO with nano-scale microporous structure. 2 Thin film, this film has photoelectric response. The nanoscale microporous TiO 2 Thin films can be efficiently combined with dyes to form dye-sensitized TiO 2 thin film electrodes.
Embodiment 3
[0033] After cleaning the conductive glass substrate, dry it with nitrogen gas, place it on the sample holder of the sputtering instrument, use pure titanium as the target material, and take it out after sputtering for 200 seconds. At this time, a layer of metal titanium is coated on the conductive substrate. membrane. Using 1M nitric acid solution as the electrolyte solution, the voltage is 15V, and the current is controlled at 0.1mA-1A to electrolyze the membrane to obtain TiO with nano-scale microporous structure. 2 Thin film, this film has photoelectric response. The nanoscale microporous TiO 2 Thin films can be efficiently combined with dyes to form dye-sensitized TiO 2 thin film electrodes.
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