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PLasma enhanced chemical deposition method of low vapor-prossure compound

A plasma and enhanced chemical technology, applied in gaseous chemical plating, metal material coating process, coating, etc.

Inactive Publication Date: 2004-05-12
SAMSUNG DISPLAY CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The disadvantage of flash evaporation is that it requires two consecutive steps, low temperature condensation followed by curing or crosslinking, and the two are separated in space and time

Method used

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  • PLasma enhanced chemical deposition method of low vapor-prossure compound
  • PLasma enhanced chemical deposition method of low vapor-prossure compound
  • PLasma enhanced chemical deposition method of low vapor-prossure compound

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0033] An experiment was performed to demonstrate that in figure 2 and the invention described above. Tetraethylene glycol diacrylate is used as liquid monomer. The temperature of the heated surface was set at about 650°F (343°C). Liquid monomer was introduced into the inlet via a 0.032 inch internal diameter capillary. The inner diameter of the ultrasonic atomizer nozzle is 0.051 inch. The deposition rate of the polymer layer was 0.5 m / min for a 25 micron thick polymer layer and 100 m / min for a 1 micron thick polymer layer. Visual inspection of the cured polymer layer did not reveal any pinholes or cracks.

[0034] conclusion

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Abstract

Generally, the apparatus of the present invention is (a) a flash evaporation housing (116) with a monomer atomizer (120) for making monomer particles (122), heated evaporation surface (124) for making an evaporate from the monomer particles, and an evaporate outlet (128), connected to (b) a glow discharge electrode (204) creating a glow discharge plasma from the evaporate, wherein (c) the substrate (104) is proximate the glow discharge plasma for receiving and cryocondensing the glow discharge plasma thereon. The method of the present invention has the steps of (a) flash evaporating a liquid monomer an evaporate outlet forming an evaporate; (b) passing the evaporate to a glow discharge electrode creating a glow discharge monomer plasma from the evaporate; and (c) cryocondensing the glow discharge monomer plasma on a substrate and cross-linking the glow discharge plasma thereon, wherein the cross-linking results from radicals created in the glow discharge plasma and achieves self curing.

Description

[0001] This application was submitted on September 29, 1998, the application number is 98809599.8, and the divisional application of the application with the same invention title as this application. field of invention [0002] The present invention generally relates to a method of making a plasma polymerized film. In particular, the invention relates to the production of plasma polymerized films by plasma enhanced chemical deposition from a source of flashed low vapor pressure compounds. The term "(meth)acrylic" as used herein means "acrylic or methacrylic". As used herein, the term "cryogenic condensation" and its morphology refer to the physical phenomenon of a phase change from a gas phase to a liquid phase when a gas comes into contact with a surface at a temperature below the dew point of the gas. Background of the invention [0003] The basic method of plasma-enhanced chemical vapor deposition (PECVD) is described in "Thin Film Processes", edited by J.L. Vossen, W. K...

Claims

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Application Information

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IPC IPC(8): C23C16/50
Inventor J·D·阿菲尼托
Owner SAMSUNG DISPLAY CO LTD