Dazzle reflection preventing film mfg. method and its device, and dazzle reflection preventing film

An anti-reflection film and a technology for manufacturing devices, which are applied in lighting devices, diffusing elements, flat products, etc., can solve the problems of opening holes, extremely reduced precision, and opening holes.

Inactive Publication Date: 2004-10-06
FUJIFILM CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0006] However, in the method of pressing the anti-reflection film by using the embossing roll and the back-up roll, in the process of applying pressing pressure to the anti-reflection film, the convex part of the embossing roll for imparting unevenness on the surface of the anti-reflection layer penetrates the anti-reflection layer. film, there is a problem of opening holes in the anti-reflection film
As a countermeasure, it can be improved to some extent by adjusting the extrusion pressure, but the problem of opening holes cannot be completely solved
Furthermore, reducing the extrusion pressure to such an extent that the openings are actually removed results in a drastic reduction in the accuracy of the reproduction

Method used

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  • Dazzle reflection preventing film mfg. method and its device, and dazzle reflection preventing film
  • Dazzle reflection preventing film mfg. method and its device, and dazzle reflection preventing film
  • Dazzle reflection preventing film mfg. method and its device, and dazzle reflection preventing film

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Embodiment Construction

[0021] Hereinafter, preferred embodiments of the method for producing the antiglare and antireflection film of the present invention, the device thereof, and the antiglare and antireflection film will be described in detail with reference to the drawings.

[0022] figure 1 It is an overall configuration diagram of the production apparatus 10 of the anti-glare anti-reflection film of the present invention, and is mainly composed of an output device 12 , an anti-reflection film forming device 14 , a copying device 16 , and a winding device 18 .

[0023] The anti-reflection film forming device 14 utilizes the coating device 22 to apply an anti-reflection layer 24 on the transparent support 20 output from the output device 12 (see FIG. image 3 ), after the antireflection layer 24 is dried by the drying device 26, the antireflection layer 24 is cured by heat treatment or ultraviolet irradiation by the curing device 28. Thus, the antireflection film 30 is formed. At this time, as...

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Abstract

To manufacture an antidazzle antireflective film which is free of boring and has good transfer precision when a surface of an antireflective layer of an antireflective film is made uneven through embossment processing. Manufactured is the antidazzle antireflective film by nipping the antireflective film 30 with an embossing roller 34 and a backup roller 36 and transferring the unevenness shape of the embossing roller 34 to the antireflective layer 24. Here, the modulus of linear elasticity and hardness of the backup roller 36 are made smaller than those of the embossing roller 34.

Description

technical field [0001] The present invention relates to a method for producing an anti-glare anti-reflection film, a device thereof, and an anti-glare anti-reflection film, and more particularly to a method for producing an anti-glare anti-reflection film used in image display devices such as liquid crystal display devices, a device thereof, and an anti-glare anti-reflection film. Anti-glare reflection film. Background technique [0002] The antireflection film is provided in various image display devices such as liquid crystal display (LCD), plasma display panel (PDP), electroluminescent display (ELD), or cathode ray tube display (CRT). Conventionally, as an antireflection film, a multilayer film in which transparent thin films of metal oxides are laminated is generally used. Various transparent films are used in order to prevent reflection of light of different wavelengths. The transparent thin film of metal oxide is formed by chemical vapor deposition (CVD) method or ph...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B5/00B29C59/04B29D11/00B29L7/00B32B3/30B32B7/02G02B1/11G02B5/02G02F1/1335H05B33/02
CPCB29C59/04G02B1/11
Inventor 匹田伸治林祯
Owner FUJIFILM CORP
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