Preparation for amorphous carbon thin-film hydrophobic material with rear surface fluorating process
A fluorination treatment, hydrophobic material technology, applied in metal material coating process, gaseous chemical plating, superimposed layer plating and other directions, can solve the problem that fluorinated amorphous carbon film cannot be directly deposited
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Embodiment 1
[0015] 1. First use one of the conventional vapor deposition methods "magnetron sputtering" to prepare a layer of amorphous carbon film on the quartz substrate with a thickness of 0.15 microns;
[0016] 2. Then put the substrate into the chemical vapor phase surface treatment chamber, vacuumize the surface treatment chamber and fill it with carbon tetrafluoride gas, the air pressure is 9500Pa;
[0017] 3. Apply a radio frequency electromagnetic field near the substrate to generate a glow discharge, and the radio frequency power density is 100W / cm 2 , the substrate temperature is 500°C, and the fluorination time is 10 minutes.
[0018] Hydrophobicity was measured on the surface treated in this example, and the static contact angle with distilled water was 120°.
Embodiment 2
[0020] 1. First use one of the conventional vapor deposition methods "plasma assisted hot wire method" to prepare a layer of amorphous carbon film on the single crystal silicon substrate with a thickness of 2.85 microns;
[0021] 2. Then put the substrate into the chemical vapor phase surface treatment chamber, vacuumize the surface treatment chamber and introduce tetrafluoroethylene, and keep the air pressure at 1.5Pa;
[0022] 3. Apply a radio frequency electromagnetic field on the substrate to generate glow discharge, and the radio frequency power density is 2.2W / cm 2 , the substrate temperature is 0°C, and the fluorination time is 120 minutes.
[0023] Hydrophobicity was measured on the surface treated in this example, and the static contact angle with distilled water was 125°.
Embodiment 3
[0025] 1. First use the "magnetron sputtering method" to prepare a layer of amorphous carbon film on the glass substrate with a thickness of 1.65 microns;
[0026] 2. Then put the substrate into the chemical vapor phase surface treatment chamber, vacuumize the surface treatment chamber and introduce carbon tetrafluoride gas, and keep the air pressure at 3000Pa;
[0027] 3. Apply a radio frequency electromagnetic field near the substrate to generate a glow discharge, and the radio frequency power density is 30W / cm 2 , the substrate temperature is 300°C, and the fluorination time is 60 minutes.
[0028] Hydrophobicity was measured on the surface treated in this example, and the static contact angle with distilled water was 145°.
[0029] No corrosion was found in the substrates of the above examples through microscopic observation, and the contact angle was over 120°.
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