Power bipolar transistor with base local heavy saturation
A bipolar transistor and heavy doping technology, which is applied in the direction of transistors, semiconductor devices, electrical components, etc., can solve the problems of Auger recombination enhancement, emission zone doping band gap narrowing, and decline, so as to achieve performance improvement and improvement Effect of performance and current gain increase
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[0039] A manufacturing process of the power bipolar transistor with locally heavily doped base region of the present invention is as follows (take a trench bipolar NPN tube as an example):
[0040] 1) The wafer used is heavily doped with N + Substrate 7;
[0041] 2) In heavily doped N + Make N- / P / N sequentially on substrate 7 + Epitaxial layer (different current gain and withstand voltage value of the device, the size of the epitaxial layer will be different);
[0042] 3) Use reactive ion etching (RIE) process to etch away N + Layer to P layer, forming a trench structure of a bipolar transistor;
[0043] 4) A heavily doped base region 9 is formed in the trench structure of the bipolar transistor according to the requirements of the device current gain;
[0044] 5) Oxidation, a high-quality oxide layer is formed on the surface of the bipolar transistor groove;
[0045] 6) Depositing silicon dioxide, filling the grooves, and planarizing the device;
[0046] 7) Use conventional metho...
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