Transistor based on bibarrier tunnel junction resonance tunneling effect
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- INST OF PHYSICS - CHINESE ACAD OF SCI
- Publication Date
- 2006-03-29
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Abstract
Description
technical field
[0001] The invention relates to a solid-state switch and amplifying device, that is, a transistor, especially a spin transistor device based on double potential barrier tunnel junction resonant tunneling effect. Background technique
[0002] Since the discovery of the giant magnetoresistance effect (GMR) in magnetic multilayer films in 1988, great progress has been made in the research and application of physics and material science. In 1993, Johnson [M. Johnson, Science 260 (1993) 320] proposed a ferromagnetic metal emitter, a non-magnetic metal base with a thickness smaller than the spin diffusion length, and another ferromagnetic metal collector: " Ferromagnetic metal / nonmagnetic metal / ferromagnetic metal" sandwich all-metal spin transistor. figure 1 is a schematic diagram of this all-metal spin transistor. The speed of this all-metal transistor can be compared with that of semiconductor Si devices, but the energy consumption is 10-20 times lower, the de...