Method for preparing glass waveguide by single-side molten salt electric field assistant ion exchange

An ion exchange and electric field assisted technology, applied in the direction of optical waveguide and light guide, can solve the problems of corrosion of metal film 8, detachment of metal film 8, and ion exchange cannot be carried out normally, so as to achieve the effect of reducing damage.

Inactive Publication Date: 2006-10-11
ZHEJIANG NANFANG COMM GROUP +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, in the actual operation process, there are certain problems in this process. As the ion exchange process proceeds, a large amount of monovalent alkali metal (Na + etc.) on the negative electrode metal film 8 is reduced to an alkali metal with extremely active chemical properties, and then reacts with oxygen in the air to form an alkaline oxide, which causes corrosion to the metal film 8 and makes the metal film 8 dissipate from the glass substrate 1 The surface falls off, so that the ion exchange cannot be carried out normally

Method used

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  • Method for preparing glass waveguide by single-side molten salt electric field assistant ion exchange
  • Method for preparing glass waveguide by single-side molten salt electric field assistant ion exchange
  • Method for preparing glass waveguide by single-side molten salt electric field assistant ion exchange

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Embodiment 1

[0030] Embodiment 1: A buried waveguide is fabricated by using a low-temperature diffusion process.

[0031] (1) Doped with rare earth ions Er 3+ and Yb 3+Evaporate (or sputter) a layer of Al with a thickness of 80-200nm on the upper surface of the phosphate glass substrate, and make a strip-shaped diffusion window with a width of 4-12 μm on the submersion through photolithography and wet etching processes;

[0032] (2) Then put the masked glass substrate into an AgNO 3 with NaNO 3 and KNO 3 The ion exchange is carried out in the mixed molten salt, the ion exchange temperature is 280 ° C, the ion exchange time is 30 minutes, the Ag in the molten salt + The ion diffusion region 4 on the glass surface is formed in the glass substrate 1 through thermal diffusion, forming the core of the surface optical waveguide;

[0033] (3) the Al film on the surface of the glass substrate is made of H 3 PO 4 Corrosive solution removal;

[0034] (4) Evaporate (or sputter) a layer of Al ...

Embodiment 2

[0037] Embodiment 2: A buried waveguide is manufactured by a medium-temperature diffusion process.

[0038] (1) Evaporate (or sputter) a layer of Gr-Au with a thickness of 80-200 nm on the upper surface of the borate glass substrate, and make a layer of Gr-Au with a width of 4-12 μm on the submerged surface by photolithography and wet etching. Striped diffusion window;

[0039] (2) Then put the masked glass substrate into an AgNO 3 with NaNO 3 and KNO 3 The ion exchange is carried out in the mixed molten salt, the ion exchange temperature is 340 ° C, the ion exchange time is 10 minutes, the Ag in the molten salt + The ion diffusion area on the glass surface is formed in the glass substrate through thermal diffusion, forming the core of the surface optical waveguide;

[0040] (3) the Gr-Au film on the surface of the glass substrate is removed by a special standard Gr-Au etching solution for the microelectronics process;

[0041] (4) Evaporate (or sputter) a layer of Al wit...

Embodiment 3

[0043] Embodiment 3: A buried waveguide is fabricated by using a high temperature diffusion process.

[0044] (1) Evaporate (or sputter) a layer of Ag with a thickness of 80-200nm on the upper surface of the silicate glass substrate, and make strips with a width of 4-12μm on the submersion by photolithography and wet etching processes Diffusion window;

[0045] (2) Then put the masked glass substrate into an AgNO 3 with NaNO 3 and KNO 3 The ion exchange is carried out in the mixed molten salt, the ion exchange temperature is 450 ° C, the ion exchange time is 3 minutes, the Ag in the molten salt + The ion diffusion area on the glass surface is formed in the glass substrate through thermal diffusion, forming the core of the surface optical waveguide;

[0046] (3) the Ag film on the surface of the glass substrate is removed by using a special standard Ag etching solution for the microelectronics process;

[0047] (4) Evaporate (or sputter) a layer of Al with a thickness of 8...

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Abstract

The invention discloses a method for producing buried glass optical waveguide by single-side fused salt electric field auxiliary ion exchange technique. Wherein, first processing the ion exchange on the glass basic plate with mask in the fused salt with high polarized ion, to attain the ion exchange area on the glass surface; preparing a baffle layer on the surface of glass basic plate and far away from the core of optical waveguide, to stop ion passing said glass basic plate in the following ion exchange process, while the passed ion will reduce the cathode and destroy the metallic film electrode; at last, the anode uses the fused salt without high polarized ion, and the cathode uses metallic film, and using single-side fused salt electric field auxiliary ion exchange technique to prepare optical waveguide. The invention can effectively restrain the hurt of cathode metallic film in the process of electric field auxiliary ion exchange, to improve the property of glass optical waveguide.

Description

technical field [0001] The invention relates to the fields of optical devices and integrated optics, in particular to a method for preparing buried glass optical waveguides by unilateral molten salt electric field assisted ion exchange. Background technique [0002] In 1969, S.E.Miller proposed the concept of integrated optics. The basic idea is to use a material with a slightly higher refractive index to make an optical waveguide on the surface of the same substrate, and then make various devices such as light sources and gratings on this basis. . Through this integration, the miniaturization, weight reduction, stabilization and high performance of the optical system can be realized. [0003] As an important class of integrated optical devices, the optical devices fabricated on glass substrates by ion exchange method have always been valued by business circles and researchers. Since the 1970s, research institutions in various countries have invested a lot of manpower and ...

Claims

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Application Information

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IPC IPC(8): G02B6/13
Inventor 郝寅雷王明华李锡华吕金良许坤良周海权
Owner ZHEJIANG NANFANG COMM GROUP
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