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Polishing liquid for grinding and polishing lithium niobate optical wafer

A technology for optical wafers and polishing fluids, applied in polishing compositions containing abrasives, optical surface grinders, grinding/polishing equipment, etc., can solve problems such as surface scratches, difficult cleaning, and low flatness, and achieve easy cleaning , high chelation, and the effect of reducing surface roughness

Inactive Publication Date: 2006-11-08
HEBEI UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
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AI Technical Summary

Problems solved by technology

[0005] The present invention aims to solve the problems existing in the CMP (chemical mechanical polishing) polishing solution of lithium niobate crystals, overcome the technical problems of surface scratches, low flatness and difficult cleaning in the existing polishing process, and provide a chemically strong , easy to clean, effectively solves the problem of scratches, high polishing rate, good fluidity, and no precipitation. Polishing liquid for grinding and polishing lithium niobate optical wafers

Method used

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Examples

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Embodiment 1

[0033] Briefly describe the preparation process of the present invention with embodiment 1:

[0034] Take 2L of silica sol with a particle size of 15-20nm, 2L of deionized water, 100mL of tetrahydroxyethylethylenediamine, 20mL of FA / OI active agent, 20mL of chelating agent FA / O, and 15ml of 25% KOH solution. Add 2L of deionized water to 2L of silica sol solution and stir to dilute, stir and add 20mL of FA / OI active agent and 20mL of chelating agent FA / O, and finally add 100mL of organic base tetrahydroxyethylethylenediamine and 25% KOH while stirring Solution 15ml.

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Abstract

The present invention discloses polishing liquid for grinding and polishing optical lithium niobate wafer. The polishing liquid consists of silica sol 30-90 vol%, organic amine alkali 1-10 vol%, inorganic alkali 1-5 vol%, activator 0.5-5 vol%, chelating agent FA / O 0.5-5 vol%, and deionized water for the rest. Under CMP and high pH condition, lithium is formed into stable complex and water soluble niobate to raise polishing efficiency and surface quality. The present invention has organic alkali and lithium niobate surface matter to form soluble amine salt easy to separate from the reaction surface, and this avoids the increase in the abrasive granularity and polishing liquid viscosity to ensure no scoring, high flatness and no adsorbate.

Description

technical field [0001] The invention relates to the technical field of chemical mechanical polishing, in particular to a polishing liquid for grinding and polishing lithium niobate optical wafers. Background technique [0002] Lithium niobate is a kind of basic material used in the fields of electronics, microelectronics, and optoelectronics. It is a functional material with various properties such as ferroelectricity, piezoelectricity, pyroelectricity, electrooptic, acoustoelectricity, and photorefractive effects. It has excellent Voltage, electro-optic, nonlinear optical properties. [0003] With the development of optoelectronic technology, new high-performance, high-precision, and highly integrated optoelectronic systems continue to emerge. The quality of material surface processing is the main parameter, especially the flatness, roughness and cleanliness directly affect the quality of devices. In order to adapt to the rapid development of optoelectronics Therefore, str...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C09G1/02B24B13/00C09G1/04
Inventor 刘玉岭武晓玲
Owner HEBEI UNIV OF TECH
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