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Hyperbranched polymer, process for producing the same and resist composition containing the hyperbranched polymer

A hyperbranched polymer and polymer technology, which is applied in the field of resist composition, can solve the problems of molecular design produced by exposure and has not yet been reported, and achieve the effects of excellent film formation, less pollution, and improved alkali solubility

Inactive Publication Date: 2007-01-17
LION CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0009] However, the actual situation is that molecular design for imparting processability by light exposure, which is required for resists, has not been reported so far, and its rapid development is expected

Method used

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  • Hyperbranched polymer, process for producing the same and resist composition containing the hyperbranched polymer
  • Hyperbranched polymer, process for producing the same and resist composition containing the hyperbranched polymer
  • Hyperbranched polymer, process for producing the same and resist composition containing the hyperbranched polymer

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1A

[0204] —Synthesis of hyperbranched polymers—

[0205] In a 50mL reaction vessel, 21mmol of chloromethylstyrene as a reaction monomer, 2.1mmol of 2-bipyridine as a catalyst, 1.1mmol of copper chloride (I) and 8mL of chlorobenzene as a solvent are charged into a 50mL reaction vessel. After replacing the inside of the reaction container, stirring was performed at a temperature of 115° C., and the polymerization reaction was carried out for 1 hour. 50 mL of tetrahydrofuran was added to the reaction liquid to dilute and dissolve the polymer, and the catalyst was removed by filtration through activated alumina. After concentrating the filtrate, 200 mL of methanol was added to precipitate the polymer, and the unreacted monomer and the reaction solvent were removed by removing the supernatant liquid. Then, the operation of dissolving the precipitated polymer in 20 mL of tetrahydrofuran and adding 500 mL of methanol to reprecipitate was repeated twice to synthesize Polymer 1 (yield 75...

Embodiment 2A

[0219] —Synthesis of hyperbranched polymers—

[0220] In embodiment 1, except that the amount of catalyst in the above-mentioned hyperbranched polymer synthesis step is 5 times, the reaction temperature is 125 ℃, and the reaction time is 30 minutes for polymerization, and the same synthetic polymer 2 as in embodiment 1 (received rate of 77%). The weight average molecular weight (Mw) and branching degree (Br) of Polymer 2 were measured in the same manner as in Example 1. The results are shown in Table 1A.

[0221] In addition to using 1 g of polymer 2 as a base polymer in the above-mentioned acid-decomposable group introduction step, using 65 mmol of p-tert-butoxystyrene as a compound containing an acid-decomposable group, and making the reaction time 3 hours , Polymerization and purification with p-tert-butoxystyrene were carried out in the same manner as in Example 1, to synthesize a target acid-decomposable group-introduced hyperbranched polymer.

[0222] The addition amo...

Embodiment 3A

[0224] —Synthesis of hyperbranched polymers—

[0225] In Example 1, except that the amount of catalyst in the above-mentioned hyperbranched polymer synthesis process is 4 times, the reaction temperature is 125 ° C, and the reaction time is 1 hour, the same synthetic polymer 3 as in Example 1 (yield 78 %).

[0226] The weight-average molecular weight (Mw) and branching degree (Br) of Polymer 3 were measured in the same manner as in Example 1. The results are shown in Table 1A.

[0227] In addition to making 1 g of the polymer 3 as the base polymer in the above-mentioned acid-decomposable group introduction step, the p-ethoxyethoxystyrene as the acid-decomposable group-containing compound was 65 mmol, and the reaction time was 3 After 1 hour, polymerization and purification with p-ethoxyethoxystyrene were carried out in the same manner as in Example 1 to synthesize a target acid-decomposable group-introduced hyperbranched polymer.

[0228] The addition amount (introduction am...

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Abstract

A hyperbranched polymer suitable as a polymer material for use in nanofabrication whose leading part is played by photolithography. There is provided a hyperbranched polymer characterized by having at its polymer molecular end an acid decomposable group, such as p-tert-butoxystyrene, bonded to a core moiety formed by living radical polymerization of chloromethylstyrene, etc.

Description

technical field [0001] The present invention relates to a hyperbranched polymer suitable for use as a polymer material for nanofabrication centering on photolithography, a method for producing the same, and a method for forming a base polymer containing the hyperbranched polymer as a resist material. Resist composition for fine patterns for super LSI manufacturing. technical background [0002] In recent years, photolithography, which has been valued as a microfabrication technology, has been miniaturized due to the reduction in wavelength of light sources, and high integration of super LSIs has been achieved. Therefore, development of a base polymer having a chemical structure transparent to each light source in a resist composition is progressing. For example, for the KrF excimer laser (wavelength 248nm), a resist composition containing a polymer with PHS (polyhydroxystyrene) as the basic skeleton has been proposed, and for the ArF excimer laser (wavelength 193nm), a resi...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C08F212/14G03F7/039H01L21/027
Inventor 金子行裕铃木薰田村实久保善靖
Owner LION CORP
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