Photosensitive resin composition and laminating article thereof
A technology of photosensitive resin and composition, applied in photosensitive material processing, optics, opto-mechanical equipment, etc., can solve problems such as short circuit and pipeline blockage in developing tank, and achieve excellent dispersion stability, good etching solution resistance, resolution good effect
Image
Examples
Embodiment
[0151] Hereinafter, the preparation method of the evaluation sample of the Example and the comparative example, and the evaluation method and evaluation result with respect to the obtained sample are demonstrated.
[0152] 1. Production of samples for evaluation
[0153] The photosensitive resin laminates in Examples and Comparative Examples were produced as follows.
[0154]
[0155] Prepare the compounds shown in Table 1, uniformly stir and mix the photosensitive resin composition shown in Table 2, and use a bar coater to uniformly coat the polyterephthalic acid as a support with a thickness of 20 μm. The surface of the ethylene glycol film was dried in a dryer at 95° C. for 4 minutes to form a photosensitive resin layer. The thickness of the photosensitive resin layer was 40 μm.
[0156] In the composition of Table 1, MEK represents methyl ethyl ketone, and the parts by mass of P-1 to P-5 in Table 2 are values including MEK.
[0157] Then, on the surface of the photo...
PUM
| Property | Measurement | Unit |
|---|---|---|
| wavelength | aaaaa | aaaaa |
| thickness | aaaaa | aaaaa |
| Tensile strength | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- IPC
- G03F7/027; G03F7/20; G03F7/26; H01L21/00
- Inventors
- 山田有里; 五十岚勉