A copper-gas media Damascus structure and its making method
A technology of gas medium and manufacturing method, which is applied in semiconductor/solid-state device manufacturing, electrical components, electrical solid-state devices, etc., can solve the problems of low manufacturing cost, and achieve the effects of being beneficial to heat conduction, structural stability, and reducing interconnection delay.
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[0057] The specific embodiments of the present invention will now be described in further detail with reference to the accompanying drawings:
[0058] The copper-gas medium multilayer Damascus structure of the present invention is as Picture 9 Shown ( Picture 9 It is a schematic diagram of the copper-gas medium Damascus structure of the present invention), and there is a dielectric layer 1 at the bottom of the entire structure. In each layer of the multi-layer Damascus structure of the Damascus structure, the diffusion barrier layer and the copper seed layer 8 are lined at the bottom and around the copper wiring 2, and the copper seed layer between the diffusion barrier layer and the copper seed layer 8 The liner is at the bottom and around the copper wiring 2, the diffusion barrier layer is lined at the bottom and around the copper seed layer; the oxide film 5 is wrapped around the diffusion barrier layer, and the silicon carbide etching barrier layer 11 covers the package T...
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