Method of laser scribing of semiconductor workpiece using divided laser beams

Abstract

This invention provides an effective and rapid method of laser processing for separating semiconductor devices formed on hard and solid substrates (6) with a one pass process. The method is based on generating fractures along the scribing trajectory which extend deep into the bulk of a workpiece (6), wherein thermal stress is induced by delivering at least two processing (ultra short pulse) pulsed-beams (7), containing at least primary and secondary pulses. Primary pulses are used to generate a heat accumulated zone, which allows for more efficient absorption of the secondary pulses, which generate a sufficient heat gradient to produce mechanical failures, necessary for mechanically separating the workpiece (6) into separate pieces.

Description

FIELD OF INVENTION[0001]The present method relates to laser material processing. More particularly it relates to methods and systems for separating hard and brittle semiconductor substrates or dies.BACKGROUND OF INVENTION[0002]Wafer dicing plays a critical role in the fabrication of semiconductor devices, devices which are becoming ever smaller and more complex. Silicon carbide (SiC) and gallium nitride (GaN) substrates are dedicated for new generation of high frequency (HF) communication and high power (HP) converter electronics. Production of such devices requires advanced die processing techniques to minimize the appearance of various internal and external defects in both the substrate and various functional layers (coatings), during wafer dicing (separation), as silicon carbide (SiC) and gallium nitride (GaN), both of them are an extremely hard materials. The process becomes more difficult as the initial wafers or substrates are coated with complex arrangements of functionalizat...

AI Technical Summary

Benefits of technology

This patent describes a way to prepare semiconductor devices on hard and solid substrates for separation. Before the cutting procedure, there is a area of damage (also called "modification") where a thermal stress-induced crack or fracture occurs on the surface of the substrate. This results from a one-pass process of heating and cooling the material. The method increases the yield of production. The substrate can be any item that is prepared for processing and then separated mechanically, such as a wafer or wafer sheet.

Problems solved by technology

Prior art methods impose limitations on substrate thickness, material type and processing quality used for wafer separation.

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