Methods for the lithographic deposition of materials containing nanoparticles

Abstract

A method for depositing nanoparticles in a thin film through the dispersion of such nanoparticles in a precursor solution which is deposited on a substrate and converted into a metal or metal oxide film. The resulting metal or metal oxide film will contain embedded nanoparticles. Such films can be used in a variety of applications such as diffusion barriers, electrodes for capacitors, conductors, resistors, inductors, dielectrics, or magnetic materials. The nanoparticle material may be selected by one skilled in the art based on the particular application.

Description

[0001] This application claims priority to Provisional Patent Application No. 60 / 221,844, filed Jul. 28, 2000, entitled "METHODS FOR THE LITHOGRAPHIC DEPOSITION OF MATERIALS CONTAINING NANOPARTICLES."[0002] This invention is related to methods of depositing films of metals or metal oxides with embedded nanoparticles, from metal complexes or precursor solutions. The invention also relates to the use of such films in a variety of applications including but not limited to microelectronics fabrication.DESCRIPTION OF RELATED ART[0003] Usually films of inorganic materials are deposited by chemical or physical vapor deposition although in some cases Sol gel or metal organic deposition have been used.[0004] None of these methods, however, are able to pattern films of materials and, therefore, must be used with other methods to form the patterned structures normally used in the construction of microelectronic devices or circuits.[0005] The photochemical deposition method differs from the abo...

AI Technical Summary

Problems solved by technology

None of these methods, however, are able to pattern films of materials and, therefore, must be used with other methods to form the patterned structures normally used in the construction of microelectronic devices or circuits.

However, the '507 patent does not disclose a photochemical technique of converting the precursor material to a metal or metal oxide film with imbedded nanoparticles.

However, the '040 patent does not disclose a means to distribute the nanoscale powders directly within a metal or metal oxide film, nor does the '040 patent teach a photochemical technique of converting the precursor material to a metal or metal oxide film.

Images