High temperature strain gages
a strain gage and high temperature technology, applied in the direction of instruments, electrical/magnetic measuring arrangements, structural/machine measurement, etc., can solve the problems of limited scope of strain gage, limited use of strain gage alone, and limited tcrs
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[0027] ITO strain gages with controlled nanoporosity were prepared by subjecting relatively thick ITO films to a post deposition anneal at 800° C. in nitrogen and exposing the same to high temperature, or by reactive sputtering in various nitrogen / oxygen / argon partial pressures and exposing to high temperature. SEM indicated that although the microstructures of the nitrogen-sputtered films were similar in appearance to those produced by a post deposition anneal in nitrogen, the average pore size and particle size were an order of magnitude smaller for those sensors prepared by sputtering in nitrogen overpressures. It appears that nitrogen was metastably retained in the individual ITO grains during sputtering and diffused out of the bulk grains at elevated temperature, eventually becoming trapped at grain boundaries and triple junctions. Under these conditions, sintering and densification of the ITO particles containing these nitrogen rich grain boundaries was retarded and a contiguo...
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