Poly amic acid system for polyimides
a polyimide and amic acid technology, applied in the direction of electrical equipment, printed circuits, transportation and packaging, etc., can solve the problems of insufficient rapid solvent removal for the xylene/nmp system, and the rate of solvent removal is much faster, etc., to achieve the effect of a large-scale production lin
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example 1
[0029] Poly amic acid powder (1 g) was dissolved in a cosolvent blend of THF (4 g) and NMP(6 g). The ratio was increased to a maximum of 90% by weight of THF combined with 10% by weight of NMP. The solution was placed on a stir plate and left at room temperature to stir overnight. The cosolvent blend produced a homogeneous solution that remained homogeneous over a period of 24 hours at room temperature. Storage of the poly amic acid for 6 months in refrigeration, using the cosolvent system, has resulted in the solution remaining homogeneous. The poly amic acid precursor was cast from the cosolvent blend onto copper foil and dried to afford the final polyimide laminate. The residual solvent retentions were about 1-3% when dried using conventional mass production equipment.
example 2
[0030] Poly amic acid powder (1 g) was dissolved in separate cosolvent blends of methylethyl ketone (MEK) (5 g ) / NMP (5 g) and Acetone (4 g) / NMP (6 g). The polymer precipitated out of both the MEK / NMP cosolvent blend and the Acetone / NMP cosolvent blend. Further, poly amic acid powder (1 g) was dissolved in separate cosolvent blends of methoxyethyl ether (MEE) (4 g) / NMP (6 g) and Toluene (4 g) / NMP (6 g). In both the MEE / NMP cosolvent blend and the Toluene / NMP solvent blend the polymer turned to gel and produced a cloudy appearance. The cosolvents described above produced nonhomogeneous solutions.
example 3
[0031] Poly amic acid powder was dissolved in 100% (wt) NMP. The solvent produced a homogeneous solution. The poly amic acid precursor was cast from the solvent onto copper foil and dried to afford the final polyimide laminate. The residual solvent retentions were about 30-35% when dried using conventional mass production equipment. Repeating the drying schedule reduced the solvent retention to about 28% resulting in the need for a secondary processing stage to remove the solvent.
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