Substrate processing method and substrate processing apparatus

a substrate processing and substrate technology, applied in the direction of photosensitive material processing, transportation and packaging, coatings, etc., can solve the problem that the air down flow described above is not able to remove the impurities of molecule level, and achieve the effect of improving the uniformity of line width
US20050130445A1Inactive Publication Date: 2005-06-16TOKYO ELECTRON LTD
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Patent Information

Authority / Receiving Office
US · United States
Patent Type
Applications(United States)
Current Assignee / Owner
TOKYO ELECTRON LTD
Publication Date
2005-06-16
Estimated Expiration
Not applicable · inactive patent

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Abstract

The wafer coated with the resist is deliberately placed in the vapor before being transferred to an aligner that exposes the resist on the wafer, the vapor, for example, the moisture, uniformly adheres onto the resist on the wafer. As a result, the substrate can uniformly be exposed in the following exposing process, and the uniformity of the line width and the like can be improved.
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Description

BACKGROUND OF THE INVENTION

[0001] 1. Field of the Invention

[0002] The present invention relates to a substrate processing apparatus for coating a semiconductor wafer with a resist and developing thereof in a fabrication of semiconductor device. In detail, the invention relates to a substrate processing apparatus that controls the atmosphere of the processing environment of the substrate.

[0003] 2. Description of the Related Art

[0004] In a process of photolithography in the semiconductor device fabrication, the surface of a semiconductor wafer (hereinafter referred to as “a wafer”) is coated with a photo-resist, exposing a mask pattern on the resist, then developing thereof, forming a resist pattern on the wafer surface. The resist coating and development are performed in an integrated coating and developing processing apparatus including a thermal processing apparatus such as a heating processing apparatus or a cooling processing apparatus. The coating and developing apparatus is...

Claims

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