Polishing film

Abstract

The present invention provides a polishing film with which, even when water containing impurity ions is used as a polishing liquid, the abrasive particles comprising SiO2 are less apt to adhere to the polished surface, e.g., the polished surface of an end of an optical fiber itself, and which is less apt to cause the optical loss attributable to scratches or edge chips in the polished surface. The polishing film hence renders good finish-polishing quality possible. This polishing film is characterized by comprising a substrate and an abrasive layer which has been disposed on a surface of the substrate and which comprises abrasive particles comprising SiO2, a binder resin, and an adhesion inhibitor containing a phosphorus compound.

Description

CROSS-REFERENCE TO RELATED APPLICATIONS[0001]This application is a Section 371 of International Application No. PCT / JP2012 / 002703, filed Apr. 18, 2012, which was published in the Japanese language on Nov. 1, 2012, under International Publication No. WO 2012 / 147312 A1 and the disclosure of which is incorporated herein by reference.BACKGROUND OF THE INVENTION[0002]The present invention relates to a polishing film. In further detail, the present invention relates to a polishing film used for polishing a polishing surface of a substance to be polished (such as an optical fiber, an optical lens or a magnetic disc substrate).[0003]Conventionally, as a connecting member of optical fibers in an optical fiber communication network, an easily-detachable optical fiber connector is widely used. When the optical fibers are connected using the optical fiber connector, they are connected in a situation where respective connecting end surfaces {end surfaces of an optical fiber body (glass fiber) an...

AI Technical Summary

Benefits of technology

The patent is about a new method for polishing optical fibers that reduces the cost of the process by using filtered water instead of ultrapure water. However, the use of filtered water can cause issues with abrasive particles containing silicon dioxide (SiO2) in the polishing liquid. These particles can stick to the surface being polished and cause defects like scratching and chipping, which can lead to light loss after the fibers are connected. The patent proposes a solution that prevents SiO2 particles from adhering to the surface and achieving a high-quality polishing finish.

Problems solved by technology

In other words, with the conventional polishing films, for example, in the final-finishing polishing process of the connecting end surface of the optical connector, when abrasive particles containing SiO2 are used, because the optical fiber body in the optical fiber connector contains SiO2, abrasive particles containing SiO2 may become adhered to the optical fiber connector, and if there is such adherence, it causes scratching and / or chipping (for example, a defect of an edge portion on the polishing surface and the like), and a light loss could occur on the connecting end surface of the optical fibers after being connected.

It is difficult for the adhered abrasive particles to be removed, and it causes scratching and chipping (for example, a defect of the edge part on the polishing surface and the like), and there is a problem where a light loss could occur on the connecting end surface of the optical fibers after being connected.

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