Polishing film

a technology of polishing film and film layer, which is applied in the direction of manufacturing tools, other chemical processes, chemistry apparatus and processes, etc., can solve the problems of difficult removal of adhered abrasive particles, scratching and chipping, and light loss on the connecting end surface, so as to achieve excellent polishing finished quality, inhibit effect, and present invention

Inactive Publication Date: 2014-10-23
BANDO CHEM IND LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

[0012]Particularly, recently, from the viewpoint of cost reduction in the polishing process, not ultrapure water or purified water but filtered water, which can be obtained without ion exchange and distilling but only by filtering for the purpose of foreign body removal, is used as a polishing liquid, and if such filtered water is used, because of an effect of impurity ions in the filtered water, abrasive particles containing SiO2 dislodged from the abrasive layer are agglutinated and their dispersibility is inhibited, and an amount of adherence of the abrasive particles including SiO2 onto the end surface of the optical fiber body after polishing may be increased. It is difficult for the adhered abrasive particles to be removed, and it causes scratching and chipping (for example, a defect of the edge part on the polishing surface and the like), and there is a problem where a light loss could occur on the connecting end surface of the optical fibers after being connected.
[0024]According to the present invention, even when water containing impurity ions is used as a polishing liquid, the abrasive particles containing SiO2 are not likely to be adhered onto the polishing surface of the substance to be polished, and a polishing film that can realize excellent polishing finished quality that is not likely to cause a light loss attributable to scratching or (defective) chipping on the polishing surface can be obtained.

Problems solved by technology

In other words, with the conventional polishing films, for example, in the final-finishing polishing process of the connecting end surface of the optical connector, when abrasive particles containing SiO2 are used, because the optical fiber body in the optical fiber connector contains SiO2, abrasive particles containing SiO2 may become adhered to the optical fiber connector, and if there is such adherence, it causes scratching and / or chipping (for example, a defect of an edge portion on the polishing surface and the like), and a light loss could occur on the connecting end surface of the optical fibers after being connected.
It is difficult for the adhered abrasive particles to be removed, and it causes scratching and chipping (for example, a defect of the edge part on the polishing surface and the like), and there is a problem where a light loss could occur on the connecting end surface of the optical fibers after being connected.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

example 1

[0071]An application liquid was prepared by mixing 66 parts by weight of organo silica sol (MEK-ST manufactured by Nissan Chemical Industries, Ltd., solid content: 30% by mass) as abrasive particles containing SiO2; 3.9 parts by weight of acrylic resin (Acrynal #22-36 manufactured by Toei Kasei Co., Ltd., solid content: 29.6% by mass) as a binder resin; 0.5 parts by weight of isocyanate (Sumidule L75 manufactured by Sumika Bayer Urethane Co., Ltd., solid content: 75% by mass) as a cross-linking agent; and 0.3 parts by weight of phosphoric acid (solid content: 85% by mass) as an anti-adhesive agent into a mixed solvent of 25.3 parts by weight of methyl ethyl ketone, 3.8 parts by weight of 2-propanol and 0.2 parts by weight of purified water (manufactured by TRUSCO Nakayama Corporation).

[0072]The application liquid was applied onto one surface of a polyester film (Lumirror T91N manufactured by Toray Industries, Inc., thickness: 75 μm) as a substrate, using a bar coating method, and th...

example 5

[0078]A polishing film 5 was produced as similar to Example 1 except for using phosphonoacetic acid (manufactured by Wako Pure Chemical Industries, Ltd.) instead of phosphoric acid as an anti-adhesive agent, and the evaluation test was conducted. Results were shown in Table 3.

TABLE 3Example 5Proportion inCompound nameapplicationProportion in(solid content proportionliquid (parts bypolishing liquid(% by mass))mass)(% by mass)1Organo silica sol (30)66.091.52Acrylic resin (29.6)3.95.33Methyl ethyl ketone (0)25.304Isocyanate (75)0.51.75phosphonoacetic acid (100)0.31.462-propanol (0)3.807Purified water (0)0.20Evaluation results:94efficiency percentage (%)

example 6

[0079]A polishing film 6 was produced as similar to Example 1 except for using cellulose resin (Ethocel 100 manufactured by Nisshin & Co., Ltd.) instead of acrylic resin, and the evaluation test was conducted. Results were shown in Table 4.

TABLE 4Example 5Proportion inCompound nameapplicationProportion in(solid content proportionliquid (parts bypolishing liquid(% by mass))mass)(% by mass)1Organo silica sol (30)66.092.02Cellulose resin (100)1.15.13Methyl ethyl ketone (0)28.104Isocyanate (75)0.51.75Phosphoric acid (85)0.31.262-propanol (0)3.807Purified water (0)0.20Evaluation results:90efficiency percentage (%)

[0080]As it is clear from the results shown in Tables 2 to 4, if the polishing film of the present invention is used, it is difficult for abrasive particles containing SiO2 to be adhered onto a polishing surface, such as an end surface of the optical fiber body after polishing, even when water containing impurity ions is used as a polishing liquid, and excellent polishing finish...

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Abstract

The present invention provides a polishing film with which, even when water containing impurity ions is used as a polishing liquid, the abrasive particles comprising SiO2 are less apt to adhere to the polished surface, e.g., the polished surface of an end of an optical fiber itself, and which is less apt to cause the optical loss attributable to scratches or edge chips in the polished surface. The polishing film hence renders good finish-polishing quality possible. This polishing film is characterized by comprising a substrate and an abrasive layer which has been disposed on a surface of the substrate and which comprises abrasive particles comprising SiO2, a binder resin, and an adhesion inhibitor containing a phosphorus compound.

Description

CROSS-REFERENCE TO RELATED APPLICATIONS[0001]This application is a Section 371 of International Application No. PCT / JP2012 / 002703, filed Apr. 18, 2012, which was published in the Japanese language on Nov. 1, 2012, under International Publication No. WO 2012 / 147312 A1 and the disclosure of which is incorporated herein by reference.BACKGROUND OF THE INVENTION[0002]The present invention relates to a polishing film. In further detail, the present invention relates to a polishing film used for polishing a polishing surface of a substance to be polished (such as an optical fiber, an optical lens or a magnetic disc substrate).[0003]Conventionally, as a connecting member of optical fibers in an optical fiber communication network, an easily-detachable optical fiber connector is widely used. When the optical fibers are connected using the optical fiber connector, they are connected in a situation where respective connecting end surfaces {end surfaces of an optical fiber body (glass fiber) an...

Claims

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Application Information

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Patent Type & Authority Applications(United States)
IPC IPC(8): B24D3/28
CPCB24D3/28B24B19/226B24B37/245B24D3/344B24D3/346
Inventor TAURA, TOSHIKAZUSAITO, KAZUOMUKAI, FUMIHIRO
Owner BANDO CHEM IND LTD
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