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Color filter and method for manufacturing the same

A technology of color filter and manufacturing method, which is applied in optics, optical components, nonlinear optics, etc., can solve problems such as poor heat resistance and color reproducibility, inability to freely configure pixels, and limit color penetration, etc., to achieve improved Heat resistance, improved color reproducibility and color penetration, and shortened process time

Inactive Publication Date: 2007-12-19
HONG FU JIN PRECISION IND (SHENZHEN) CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0010] But, the color coating that is charged in the above-mentioned prior art is an organic resin, and its heat resistance and color reproducibility are relatively poor, and using the color coating in the prior art will limit the improvement of color penetration.
In addition, limited by the electrodes, the pixels cannot be freely configured

Method used

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  • Color filter and method for manufacturing the same
  • Color filter and method for manufacturing the same

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Embodiment Construction

[0025] Please refer to FIG. 2 to FIG. 6 together, which are flowcharts of the manufacturing method of the color filter of the present invention. In the manufacturing method of the color filter of the present invention, the method of forming the black matrix layer, the first, the second and the third interference region will adopt the physical vapor deposition method or the chemical vapor deposition method, and the sputtering method is taken as an example in this embodiment. The detailed description of the manufacturing method of the color filter of the present invention is as follows.

[0026] As shown in FIG. 2, a substrate 60 is provided, and its material is glass. First clean the substrate 60 to remove inorganic or organic substances on its surface; then provide a photomask 21, which has a designed pattern, align the photomask 21 with the substrate 60, and place the two on the substrate. The sputtering step is carried out in a sputtering machine (not shown). The target ma...

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Abstract

The present invention relates to preparation method for color light filter and comprises follows steps: supply a base plate and first light shield with given design, form black array layer on the base plate; supply second light shield with given design, form first interference zone on the base plate to show red; supply third light shield with given design, form second interference zone on the base plate to show green; supply fourth light shield with given design, form third interference zone on the base plate to show blue; the first, second and third interference zone form on the base plate repeated by turns.

Description

【Technical field】 [0001] The invention relates to a color filter and a manufacturing method thereof, in particular to a color filter for a liquid crystal display and a manufacturing method thereof. 【Background technique】 [0002] Liquid crystal display is a passive display device. In order to achieve the effect of color display, it is necessary to provide it with a color filter. Transistor, TFT) layer and other components such as liquid crystal in between to achieve the effect of displaying different color images. The color filter is generally arranged between the upper substrate and the indium tin oxide (ITO) electrode, and mainly includes a black matrix and a colored layer. [0003] At present, there are six main methods for manufacturing color filters: dyeing, etching, pigment dispersion, electroplating, printing and dry film transfer. [0004] The dyeing method and etching method use dyes as the main filter material. The dyes have the advantages of various types, unifo...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B5/23G02F1/1335
Inventor 吴美玲叶圣修彭家鹏
Owner HONG FU JIN PRECISION IND (SHENZHEN) CO LTD